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Electrostatic chuck

An electrostatic chuck, power technology, applied in the direction of holding devices, circuits, electrical components, etc. where electrostatic attraction is applied

Active Publication Date: 2012-12-12
CREATIVE TECH CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In addition, there is also the problem of increasing the size of the internal power supply in order to ensure sufficient power, and there are also concerns about contamination of peripheral equipment including the electrostatic chuck by liquid leakage from the rechargeable battery, and the influence of leakage currents, etc.

Method used

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  • Electrostatic chuck
  • Electrostatic chuck

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Embodiment Construction

[0026] Next, preferred embodiments of the present invention will be specifically described with reference to the drawings. In addition, the present invention is not limited to the description below.

[0027] figure 1 It is a schematic cross-sectional view showing a state in which a silicon wafer w is sucked and held by using the electrostatic chuck 8 of the present invention in a parallel plate type plasma etching apparatus 11 and an etching process of the silicon wafer w is performed. In the electrostatic chuck 8 according to this embodiment, the electrode sheet 5 is pasted on the upper surface side of an aluminum metal base 1 with a thickness of 12 mm and a diameter of 340 mm. The electrode sheet 5 is formed by stacking the lower insulating layer 2 and the upper insulating layer 4 composed of a polyimide film with a thickness of 100 μm and a diameter of 298 mm on the upper and lower surfaces of the adsorption electrode 3, wherein the adsorption electrode 3 is made of coppe...

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PUM

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Abstract

Provided is an electrostatic chuck (8) of self power supply type, which is capable of supplying power while generating power to be used by an attraction electrode (3) during processing of a substrate. The electrostatic chuck (8) attracts and holds a substrate in a substrate processing apparatus (11) that processes the substrate while generating optical energy. The electrostatic chuck (8) includes: an electrode sheet (5) including an attraction electrode (3); a metal base (1) having the electrode sheet (5) laminated on an upper surface side thereof; an internal power supply for obtaining power to be supplied to the attraction electrode (3) ; and a voltage boost circuit (7) for boosting voltage of the power obtained by the internal power supply. The internal power supply includes a solar cell (6), and converts the optical energy into the power during the processing of the substrate, to thereby cause the electrode sheet (5) to attract and hold the substrate.

Description

technical field [0001] The present invention relates to an electrostatic chuck with an internal power supply. Background technique [0002] In semiconductor manufacturing processes such as ion implantation equipment, ion doping equipment, and plasma immersion equipment, exposure equipment using electron beams, extreme ultraviolet (EUV) lithography, etc., wafer inspection equipment such as silicon wafers, etc. Electrostatic chucks are used in various devices to attract and hold semiconductor substrates. In addition, in the field of liquid crystal production, electrostatic chucks are used for attracting and holding insulating substrates in substrate lamination equipment and ion doping equipment used for pressing liquid crystals into glass substrates and the like. [0003] In general, an electrostatic chuck is formed by laminating an electrode sheet that adsorbs a substrate such as a semiconductor substrate or a glass substrate on the upper surface side of a metal base. Then,...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/683H02N13/00
CPCH01L21/6833H02N13/00
Inventor 辰己良昭藤泽博
Owner CREATIVE TECH CORP