Method for preparing nitrogen-doped graphene material with hydrothermal process
Patent Information
- Authority / Receiving Office
- CN Ā· China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- HEILONGJIANG UNIV
- Publication Date
- 2013-02-06
- Estimated Expiration
- Not applicable Ā· inactive patent
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Abstract
Description
technical field
[0001] The invention relates to a preparation method of a nitrogen-doped graphene material. Background technique
[0002] Graphene with a two-dimensional structure has excellent physical and chemical properties, and has important application value in fields such as field emission transistors, supercapacitors, and lithium-ion batteries. However, nitrogen doping is very important for tuning the electronic structure of graphene. Nitrogen-doped graphene has important applications in supercapacitors, fuel cells and other fields. Therefore, in order to meet the needs of different fields, the design and synthesis of nitrogen-doped two-dimensional materials is very necessary. The traditional method for preparing nitrogen-doped graphene mainly contains: (1) in the process of preparing graphene by chemical vapor deposition (CVD), feed ammonia gas simultaneously and carry out nitrogen doping, and the highest nitrogen content is 5%; ( 2) In the process of preparing gr...