Method for manufacturing glass substrate all buried strip-type optical waveguide stack

A manufacturing method and optical waveguide technology, applied in the direction of optical waveguide light guide, light guide, optics, etc., can solve the problem of not making a fully buried strip optical waveguide stack, increasing optical transmission loss, fiber coupling loss, and increasing the size of the core of the optical waveguide 5 and other issues, to achieve the effect of being suitable for large-scale production, low cost, and low loss

Inactive Publication Date: 2011-09-21
ZHEJIANG UNIV
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  • Abstract
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Problems solved by technology

But there are two important defects in this optical waveguide: First, the existence of spherical aberration in the optical system increases the size of the core of the optical waveguide 5 and makes its shape irregular, which does not match the core of the optical fiber, thereby increasing the optical transmission loss and Coupling loss with the optical fiber; second, the strip optical waveguide produced by this method can only be written one by one, the production speed is limited, and the femtosecond laser is expensive, and the production cost of the optical device is relatively high
[0006] Fabrication of fully buried strip optical waveguide stacks on multi-component glass has not been reported yet

Method used

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  • Method for manufacturing glass substrate all buried strip-type optical waveguide stack
  • Method for manufacturing glass substrate all buried strip-type optical waveguide stack
  • Method for manufacturing glass substrate all buried strip-type optical waveguide stack

Examples

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Embodiment 1

[0033] combine figure 2 As shown, in order to make a double-layer fully buried strip optical waveguide stack, the process steps are as follows:

[0034] 1) preparing a phosphate glass substrate 3;

[0035] Wash the glass substrate 3 with concentrated sulfuric acid, rinse it with deionized water, and dry it in a dust-free environment;

[0036] 2) Fabricate a layer of aluminum film with a thickness of 100nm on the surface of the clean glass substrate 3 by a sputtering process, and fabricate an optical waveguide mask 6 on the surface of the glass substrate 3 through microfabrication techniques such as conventional photolithography and corrosion;

[0037] 3) ion exchange to form the first layer of surface optical waveguide 7;

[0038] Sodium nitrate and silver nitrate in a molar ratio of 100:1 are used as the ion exchange source and heated to make it melt, then the glass substrate 3 is immersed in the exchange source, the exchange temperature is 300°C, and the exchange time is ...

Embodiment 2

[0048] combine figure 2 As shown, in order to make a double-layer fully buried strip optical waveguide stack, the process steps are as follows:

[0049] 1) preparing a silicate glass substrate 3;

[0050] Wash the glass substrate 3 with concentrated sulfuric acid, rinse it with deionized water, and dry it in a dust-free environment;

[0051]2) An aluminum film with a thickness of 100nm is fabricated on the surface of the clean glass substrate 3 through a thermal evaporation process, and an optical waveguide mask 6 is fabricated on the surface of the glass substrate 3 through microfabrication processes such as conventional photolithography and corrosion;

[0052] 3) ion exchange to form the first layer of surface optical waveguide 7;

[0053] Potassium nitrate is used as the ion exchange source and heated to make it melt, the glass substrate 3 is immersed in the exchange source, the exchange temperature is 400 ° C, the exchange time is 5 hours, and finally the glass substrat...

Embodiment 3

[0063] to combine figure 2 As shown, in order to make a double-layer fully buried strip optical waveguide stack, the process steps are as follows:

[0064] 1) preparing a silicate glass substrate 3;

[0065] Wash the glass substrate 3 with concentrated sulfuric acid, rinse it with deionized water, and dry it in a dust-free environment;

[0066] 2) An aluminum film with a thickness of 100nm is fabricated on the surface of the clean glass substrate 3 through a thermal evaporation process, and an optical waveguide mask 6 is fabricated on the surface of the glass substrate 3 through microfabrication processes such as conventional photolithography and corrosion;

[0067] 3) ion exchange to form the first layer of surface optical waveguide 7;

[0068] Sodium sulfate and copper sulfate are used as the ion exchange source in a molar ratio of 1:1 and heated to melt, then immerse the glass substrate 3 in the exchange source, the exchange temperature is 560°C, and the exchange time is...

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Abstract

The invention discloses a method for manufacturing glass substrate all buried strip-type optical waveguide stack. The glass substrate all buried strip-type optical waveguide stack is formed by manufacturing a plurality of layers of buried optical waveguides on a glass substrate in sequence through an ion exchange and electric field assisted ion diffusion technology. The strip-type optical waveguide stack which is manufactured by the method has the characteristics of simple and mature process, simple integration and low loss; and the shape of a core part of the obtained optical waveguide is symmetrical.

Description

technical field [0001] The invention relates to a method for manufacturing a glass-based fully buried strip optical waveguide stack. Background technique [0002] The basic idea of ​​integrated optics is to make optical waveguides with materials with a slightly higher refractive index on the surface of the same substrate, and then make various devices such as light sources and gratings on this basis. Through this integration, miniaturization, weight reduction, stabilization and high performance of the optical system can be realized. Since the integrated optics technology was proposed, it has become the goal of researchers to improve the integration and reduce the size of the device. Realizing three-dimensional integration by fabricating strip optical waveguide stacks is an effective way to improve the integration level. Glass has advantages in terms of price, light loss, and light polarization dependence. At present, the realization of three-dimensional integration on gla...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B6/134G02B6/136G02B6/13
Inventor 郝寅雷郑斌杨建义江晓清李宇波周强王明华
Owner ZHEJIANG UNIV
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