High-hardness high-elastic-modulus TiAlN/AlON nano multilayer coating and preparation method thereof
A nano-multilayer and nano-coating technology, which is applied in coating, nanotechnology, nanotechnology and other directions, can solve the problem that hardness, oxidation resistance temperature and deposition efficiency cannot be balanced, hardness and elastic modulus are not high enough, and high temperature oxidation resistance is poor. and other problems, to achieve the effect of excellent high temperature oxidation resistance, high production efficiency and low equipment requirements
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Embodiment 1
[0040] The high-hardness and high-elastic-modulus TiAlN / AlON nano-multilayer coating described in the present invention is prepared by reactive sputtering on a multi-target magnetron sputtering apparatus, and its method steps and process parameters are as follows:
[0041] (1), cleaning the substrate
[0042] The substrate used is W6Mo5Cr4V2 high-speed steel. Firstly, the polished and mirror-polished substrate is sent to the M308457 ultrasonic cleaning machine, and cleaned by 15-30kHz ultrasonic waves in analytical pure anhydrous alcohol and acetone for 5-10 minutes; then ion cleaning is performed. , that is, put the substrate into the vacuum chamber and evacuate to 5×10 -3 Ar gas is introduced after Pa, and the vacuum degree is maintained at 2-4Pa; the substrate is bombarded with ions for 30min with an intermediate frequency of 13.56Hz, and the power is 80-100W; the background vacuum of the vacuum chamber is better than 3×10 -3 Pa.
[0043] (2), alternately sputtering TiAlN...
Embodiment 2
[0054] The preparation method of TiAlN / AlON nanometer multilayer coating with high hardness and high elastic modulus, the substrate used is W6Mo5Cr4V2 high-speed steel, and the method steps are the same as in Example 1.
[0055] The control parameters of the sputtering process are as follows:
[0056] Using TiAl (50 atom%:50 atom%) alloy target with a diameter of 75mm; Ar gas flow: 10-50sccm, N 2 Gas flow: 1-30sccm, Ar gas partial pressure is 0.194Pa, N 2 The gas partial pressure is 0.606×10 -2 Pa; TiAlN layer sputtering power 250W, deposition time 18s;
[0057] Using Al 2 o 3 Target, 75mm in diameter; Ar gas flow: 10-50sccm, N 2 Gas flow: 1-30sccm, Ar gas partial pressure is 0.194Pa, N 2 The gas partial pressure is 0.606×10 -2 Pa; AlON layer sputtering power 120W, deposition time 3s;
[0058] Target base distance: 3-7cm; total air pressure range 0.1-0.4Pa; substrate temperature range <200°C.
[0059] The finally obtained TiAlN / AlON nano-multilayer coating with hi...
Embodiment 3
[0063] The preparation method of TiAlN / AlON nanometer multilayer coating with high hardness and high elastic modulus, the substrate used is W6Mo5Cr4V2 high-speed steel, and the method steps are the same as in Example 1.
[0064] The control parameters of the sputtering process are as follows:
[0065] Using TiAl (50 atom%:50 atom%) alloy target with a diameter of 75mm; Ar gas flow: 10-50sccm, N 2 Gas flow: 1-30sccm, Ar gas partial pressure is 0.194Pa, N 2 The gas partial pressure is 0.606×10 -2 Pa; TiAlN layer sputtering power 250W, deposition time 18s;
[0066] Using Al 2 o 3 Target, 75mm in diameter; Ar gas flow: 10-50sccm, N 2 Gas flow: 1-30sccm, Ar gas partial pressure is 0.194Pa, N 2 The gas partial pressure is 0.606×10 -2 Pa; AlON layer sputtering power 80W, deposition time 3s;
[0067] Target base distance: 3-7cm; total air pressure range 0.1-0.4Pa; substrate temperature range <200°C.
[0068] The finally obtained TiAlN / AlON nano-multilayer coating with hig...
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