Tin-lead welding strip for solar photovoltaic assembly and manufacturing method thereof
A solar photovoltaic and manufacturing method technology, applied in photovoltaic power generation, final product manufacturing, sustainable manufacturing/processing, etc., to achieve the effects of low volume resistivity, low melting point, and enhanced adhesion
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Embodiment 1
[0034] The copper strip substrate is commercially available red copper strip, and the copper strip substrate is subjected to heat treatment at 400° C. for 90 minutes.
[0035] The heat-treated red copper strip is electroplated through an electroplating solution containing Sn and Pb, and the molar concentration ratio of Sn and Pb is controlled at 30:10; the moving speed of the copper strip substrate is controlled at 10m / min, and the pH value of the electroplating solution is controlled at 1. The temperature of the plating solution is controlled at 20°C, and the current density is controlled at 30A / dm 2 , the electroplating time is controlled at 2 minutes, and the coating thickness is controlled at 10 microns. A solder strip with a weight percentage of tin and lead in the plating layer of 63:37 was obtained.
Embodiment 2
[0037] The copper strip substrate is commercially available red copper strip, and the copper strip substrate is subjected to heat treatment at 750° C. for 30 minutes.
[0038] The heat-treated oxygen-free copper strip is electroplated through an electroplating solution containing Sn and Pb, and the molar concentration ratio of Sn and Pb is controlled at 30:20; the moving speed of the copper strip substrate is controlled at 15m / min, and the pH value of the electroplating solution is controlled at 2. The temperature of the electroplating solution is controlled at 25°C, and the current density is controlled at 40A / dm 2 , the electroplating time is controlled at 1 minute, and the coating thickness is controlled at 15 microns. A solder strip with a weight percentage of tin and lead in the plating layer of 60:40 was obtained.
Embodiment 3
[0040] A commercially available oxygen-free copper strip was used as the base material of the copper strip, and heat treatment was performed on the base material of the copper strip, and the heat treatment was performed at 550° C. for 60 minutes.
[0041] The heat-treated oxygen-free copper strip is electroplated through an electroplating solution containing Sn and Pb, and the molar concentration ratio of Sn and Pb is controlled at 30:8; the moving speed of the copper strip substrate is controlled at 20m / min, and the pH value of the electroplating solution is controlled at 1.5, the temperature of the electroplating solution is controlled at 15°C, and the current density is controlled at 30A / dm 2 , the electroplating time is controlled at 2 minutes, and the coating thickness is controlled at 8 microns. A solder strip with a weight percentage of tin and lead in the plating layer of 70:30 was obtained.
[0042] According to the actual test results, compared with the product prod...
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