Porcelain oxidation method of aluminum piece
A technology for porcelain oxidation and aluminum parts, which is applied in the field of porcelain oxidation of aluminum parts, can solve the problems of unstable process, too much influence, and high price, and achieve good bonding force, high hardness and wear resistance, and electric resistance. Good insulation and corrosion resistance
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Embodiment 1
[0015] After the aluminum material is mechanically polished, chemically degreased and corroded, cleaned, neutralized, cleaned, chemically oxidized, cleaned, scalded with hot water (50°C), dried with compressed air, and dried, porcelain can be formed on the surface of the aluminum material. plasma membrane.
[0016] The composition of the oxidation solution in the chemical oxidation step is as follows: chromic anhydride 10g / L, oxalic acid 15g / L, citric acid 5 g / L, nickel sulfate 10g / L;
[0017] The process parameters of the chemical oxidation step are as follows: current intensity 1A / dm 2 , Temperature: 15°C, time: 60min, voltage: 45v.
[0018] The obtained film is silver-gray, with a film thickness of 30 microns. The film layer has good bonding force, high hardness and wear resistance, good heat insulation, electrical insulation and corrosion resistance, and can meet various technical indicators of hard oxidation.
Embodiment 2
[0020] After the aluminum material is mechanically polished, chemically degreased and corroded, cleaned, neutralized, cleaned, chemically oxidized, cleaned, scalded with hot water (50°C), dried with compressed air, and dried, porcelain can be formed on the surface of the aluminum material. plasma membrane.
[0021] The composition of the oxidation solution in the chemical oxidation step is as follows: chromic anhydride 5g / L, oxalic acid 10g / L, citric acid 3 g / L, nickel sulfate 8g / L;
[0022] The process parameters of the chemical oxidation step are as follows: current intensity 0.5A / dm 2 , Temperature: 18°C, time: 55min, voltage: 40v.
[0023] The obtained film is silver-gray, with a film thickness of 25 microns. The film layer has good bonding force, high hardness and wear resistance, good heat insulation, electrical insulation and corrosion resistance, and can meet various technical indicators of hard oxidation.
Embodiment 3
[0025] After the aluminum material is mechanically polished, chemically degreased and corroded, cleaned, neutralized, cleaned, chemically oxidized, cleaned, scalded with hot water (50°C), dried with compressed air, and dried, porcelain can be formed on the surface of the aluminum material. plasma membrane.
[0026] The composition of the oxidation solution in the chemical oxidation step is as follows: chromic anhydride 1g / L, oxalic acid 12g / L, citric acid 1 g / L, nickel sulfate 5g / L;
[0027] The process parameters of the chemical oxidation step are as follows: current intensity 0.8A / dm 2 , Temperature: 20°C, time: 50min, voltage: 25v.
[0028] The obtained film is silver-gray, with a film thickness of 20 microns. The film layer has good bonding force, high hardness and wear resistance, good heat insulation, electrical insulation and corrosion resistance, and can meet various technical indicators of hard oxidation.
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