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Lanthana cerium oxyfluoride rare earth polishing liquid and preparation method thereof

A polishing technology of lanthanum cerium oxyfluoride and rare earth, which is applied in the field of rare earth polishing liquid and its preparation, can solve the problems of low polishing precision and large particle size of polishing powder, and achieve fast polishing rate, small rare earth particle size and less scratches Effect

Active Publication Date: 2012-02-01
上海华明高纳稀土新材料有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Patent CN101899281 discloses a manufacturing method of polishing powder, but the particle size of the polishing powder is large and the polishing precision is low

Method used

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  • Lanthana cerium oxyfluoride rare earth polishing liquid and preparation method thereof
  • Lanthana cerium oxyfluoride rare earth polishing liquid and preparation method thereof

Examples

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Effect test

Embodiment 1

[0042] (1) Precipitation: 1 L of lanthanum cerium nitrate aqueous solution with a concentration of 100 g / l is heated to 80° C., wherein the fraction of cerium in the solution to the total mass of lanthanum cerium is 60 wt%, and a concentration of 60 g / l is added under stirring conditions. Ammonium bicarbonate was precipitated until the pH value of the mixed solution was 6.5, filtered and washed 3 times with deionized water to obtain a mixture of lanthanum and cerium carbonate;

[0043] (2) Fluorination: add hydrofluoric acid to the obtained lanthanum cerium carbonate mixture to carry out fluorination reaction, wherein the addition of hydrofluoric acid is 5wt% of the total weight of lanthanum cerium carbonate;

[0044] (3) Roasting: the lanthanum cerium carbonate after fluorination is centrifugally separated and dehydrated, and the filter cake obtained is dried at 100° C. for 15 hours. After drying, the powder is roasted at 950° C. for 5 hours to obtain lanthanum cerium oxyfluor...

Embodiment 2

[0048](1) Precipitation: 1 L of lanthanum cerium nitrate aqueous solution with a concentration of 150 g / l is heated to 80° C., wherein the cerium in the solution accounts for 70 wt % of the total mass of lanthanum cerium, and a concentration of 60 g / l is added under stirring conditions. Ammonium bicarbonate and sodium carbonate mixed solution are precipitated (ammonium bicarbonate and sodium carbonate mass ratio are 1: 1), until the pH value of the mixed solution is 8.5, after filtering, wash with deionized water 3 times to obtain a mixture of lanthanum and cerium carbonate;

[0049] (2) Fluorination: adding hydrofluoric acid to the obtained lanthanum cerium carbonate mixture to carry out fluorination reaction, wherein the addition of hydrofluoric acid is 7wt% of the total weight of lanthanum cerium carbonate;

[0050] (3) Roasting: the fluorided lanthanum cerium carbonate is centrifugally separated and dehydrated to obtain a filter cake that is dried at 120° C. for 12 hours, a...

Embodiment 3

[0054] (1) Precipitation: Heat 1 L of lanthanum cerium chloride aqueous solution with a concentration of 200 g / L to 90° C., wherein the cerium in the solution accounts for 80 wt % of the total mass of lanthanum cerium, and add a concentration of 60 g / L under stirring conditions. Precipitate with sodium carbonate until the pH value of the mixed solution is 10, filter and wash with deionized water 3 times to obtain a mixture of lanthanum and cerium carbonate;

[0055] (2) Fluorination: adding hydrofluoric acid to the lanthanum cerium carbonate precipitate to carry out fluorination reaction, wherein the addition of hydrofluoric acid is 7wt% of the total weight of lanthanum cerium carbonate;

[0056] (3) Roasting: the lanthanum cerium carbonate after fluorination is centrifugally separated and dehydrated, and the filter cake obtained is dried at 120° C. for 12 hours. After drying, the powder is roasted at 900° C. for 8 hours to obtain lanthanum cerium oxyfluoride polishing powder (...

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Abstract

The invention provides a lanthana cerium oxyfluoride rare earth polishing liquid and a preparation method thereof. The lanthana cerium oxyfluoride rare earth polishing liquid contains lanthana cerium oxyfluoride polishing powder, a dispersing agent and a pH value regulating agent, based on water as a carrier; the content of the dispersing agent is 0.5-1wt% of the total mass of the polishing liquid, the amount of the pH value regulating agent is based on the fact that the pH value of the polishing liquid reaches 8.5-10.0 as a reference, the mass solid content of the polishing liquid is 25-45wt%, the mass of cerium accounts for 60-80wt% of total mass of lanthana and cerium, and the mass fraction of fluoride is 3-5wt% of total mass of lanthana cerium oxyfluoride. The lanthana cerium oxyfluoride rare earth polishing liquid has the performance characteristics of high suspending stability, rapid polishing rate, less scratch and high abrasion resistance on silicon oxide glass, and the particle size of corresponding rare earth particle is small; and the pH value regulating agent and the organic dispersing agent are added, thereby delaying the deposition of an abrasive material in the material liquid, improving the polishing rate of the polishing liquid on a glass substrate and reducing the scratch.

Description

technical field [0001] The invention relates to a rare earth polishing liquid and a preparation method thereof. Background technique [0002] Chemical Mechanical Polishing (CMP), as an important technology that can provide global planarization in the semiconductor manufacturing process, will play an increasingly important role with the continuous development of semiconductor technology and the continuous reduction of semiconductor device structures . [0003] The overall CMP device is mainly composed of three parts: the workpiece carrier, the platform for placing the polishing pad and the slurry supplier. During chemical mechanical polishing, the workpiece is rotated under the drive of the carrier, and the pressure head is also rotated on the polishing pad under a certain pressure. The polishing slurry composed of abrasives and chemical solutions is on both the workpiece and the polishing pad. flows between. At this time, due to chemical reactions such as hydrolysis or co...

Claims

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Application Information

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IPC IPC(8): C09G1/04
Inventor 尹先升高玮赵月昌杨筱琼陈曦赵秀娟
Owner 上海华明高纳稀土新材料有限公司
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