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Multipurpose polishing solution main solution

A polishing liquid, multi-purpose technology, applied in polishing compositions containing abrasives, etc., can solve the problem of a single use range of the same polishing liquid, and achieve the effects of good flatness, good suspension, and fast polishing rate

Pending Publication Date: 2020-09-11
JIANGSU KERUN PHOTOELECTRIC TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The purpose of the present invention is to solve the technical problem that the range of use of the same kind of polishing liquid is single in the prior art, and a kind of multi-purpose polishing liquid main liquid that can be used in one liquid is provided

Method used

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  • Multipurpose polishing solution main solution

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0039] Prepare 10kg multi-purpose polishing liquid main liquid:

[0040] Component A: 20 g of hexamethylenetetramine;

[0041] Ingredient B: Sodium Tripolyphosphate 50g;

[0042] Component C: 100 g of triethylenediamine;

[0043] Nonionic surfactant: lauryl oleyl alcohol 1g;

[0044] Defoamer: polyether defoamer 0.1g;

[0045] Abrasive: SiO 2 Hydrosol 1000g;

[0046] Deionized water: 8828.9g.

[0047] The preparation method is as follows: add component A to the aqueous abrasive solution, and keep stirring, then add non-ionic surfactant and component B, and fully stir, at the same time add defoamer dropwise until the foam is eliminated, then add component C, And when the pH value reaches 11-12, the filtration and purification treatment is the main liquid of the multi-purpose polishing liquid.

[0048] (1) Configure 10000g sapphire polishing liquid and its polishing method

[0049] Mix the main liquid of multi-purpose polishing liquid with deionized water in a ratio of 1...

Embodiment 2

[0060] Prepare 10kg multi-purpose polishing liquid main liquid:

[0061] Component A: 500 g of hexamethylenetetramine;

[0062] Component B: sodium tripolyphosphate 600g;

[0063] Component C: 600g of triethylenediamine;

[0064] Nonionic surfactant: lauryl oleyl alcohol 60g;

[0065] Defoamer: polyether defoamer 100g;

[0066] Abrasive: A1 2 o 3 Hydrosol 5000g;

[0067] Deionized water: 3140g.

[0068] The preparation method is as follows: add component A to the aqueous abrasive solution, and keep stirring, then add non-ionic surfactant and component B, and fully stir, at the same time add defoamer dropwise until the foam is eliminated, then add component C, And when the pH value reaches 11-12, the filtration and purification treatment is the main liquid of the multi-purpose polishing liquid.

[0069] (1) Configure 10000g sapphire polishing liquid and its polishing method

[0070] Mix the main liquid of multi-purpose polishing liquid with deionized water in a ratio o...

Embodiment 3

[0078] Prepare 100kg multi-purpose polishing liquid main liquid:

[0079] Component A: 3000 g of hexamethylenetetramine;

[0080] Ingredient B: sodium tripolyphosphate 3000g;

[0081] Component C: 3000g of triethylenediamine;

[0082] Nonionic surfactant: 300g of lauryl oleyl alcohol;

[0083] Defoamer: polyether defoamer 500g;

[0084] Abrasive: SiO 2 Hydrosol 30000g;

[0085] Deionized water: 60200g.

[0086] The preparation method is as follows: add component A to the aqueous abrasive solution, and keep stirring, then add non-ionic surfactant and component B, and fully stir, at the same time add defoamer dropwise until the foam is eliminated, then add component C, And when the pH value reaches 11-12, the filtration and purification treatment is the main liquid of the multi-purpose polishing liquid.

[0087] (1) Configure 10000g sapphire polishing liquid and its polishing method

[0088] Mix the main liquid of multi-purpose polishing liquid with deionized water in a ...

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Abstract

The embodiment of the invention discloses a multipurpose polishing solution main solution, and belongs to the technical field of surface treatment, the multipurpose polishing solution main solution comprises a component A selected from one or more of ethanolamine, hexamethylenetetramine, pyridine, triethanolamine, N-methylmorpholine, tetramethylethylenediamine and tetramethylammonium hydroxide; the component B is selected from one or more of sodium tripolyphosphate, sodium polyphosphate, sodium hexametaphosphate, sodium pyrophosphate, diethylenetriamine pentaacetic acid amino trimethylene phosphonic acid, ethylenediamine tetramethylene phosphonic acid, diethylenetriamine pentamethylene phosphonic acid, amino trimethylene phosphonic acid, polyacrylic acid, polyepoxysuccinic acid and maleicacid; and the component C is selected from one or more of triethylene diamine, ethylenediamine, isopropylamine and p-toluidine. The multipurpose polishing solution main solution not only can be used for polishing sapphire materials, but also can be used for polishing glass materials, ceramic materials and the like, realizes multiple purposes, and is low in cost, simple in component, easy to degrade and environment-friendly.

Description

technical field [0001] The invention belongs to the technical field of surface treatment, and in particular relates to a multipurpose polishing liquid main liquid. Background technique [0002] Polishing and surface processing of sapphire, ceramics, glass and other materials are technologies involving many fields, including LED substrates, LCD panels, optical glass, ceramic substrates, and ferrite substrates. [0003] At present, the polishing liquids on the market are relatively targeted and have a variety of varieties. For enterprises to process multiple materials, they need to purchase polishing liquids from various manufacturers, which will result in many varieties, difficult storage, and error-prone use. In addition, the processed materials are brittle, and the quality of mechanical polishing cannot be guaranteed. Especially in the application of materials such as cerium oxide in traditional processes, the cleaning process of processed products is complicated, and the c...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C09G1/02
CPCC09G1/02
Inventor 张卫兴阳志强刘宇宁张振兴马静
Owner JIANGSU KERUN PHOTOELECTRIC TECH CO LTD
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