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Preparation method of transparent conductive film

A thin-film preparation and thin-film technology, applied in the field of transparent conductive thin-film preparation, can solve problems such as inability to obtain AZO thin films

Inactive Publication Date: 2012-02-15
杨武保 +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Magnetron sputtering deposits AZO films, which have extremely high requirements on equipment, raw materials, process parameters, etc., otherwise qualified AZO films cannot be obtained

Method used

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  • Preparation method of transparent conductive film
  • Preparation method of transparent conductive film
  • Preparation method of transparent conductive film

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Experimental program
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Effect test

Embodiment 1

[0021] The company's special experimental machine, the multi-arc target made of AZO (aluminum-doped zinc oxide) material, such as figure 1 Shown; the glass substrate is used after alcohol ultrasonic cleaning and drying; between the substrate and the cathode arc source, a baffle is installed such as figure 2 ; The distance from the substrate to the cathode arc source is 35cm; the coating process is: deposition temperature, 180°C; ultimate vacuum, -3 Pa; working gas, argon and oxygen, where Ar / O 2 =10:1; working pressure, 6×10 -1 Pa; deposition time, 15min. Optical and electrical performance analysis shows that the transmittance of the resulting AZO film in the visible region exceeds 88% ( image 3 ), the sheet resistance is less than 30Ω / □. Surface morphology analysis showed that the particles in the obtained AZO film were smaller than 1 micron (Fig. 4).

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Abstract

The invention discloses a method for preparing an aluminum doped zinc oxide (AZO) film by utilizing the multi-arc ion plating technology. The AZO material is used as the target material and the anti-drip multi-arc ion plating technology is adopted to deposit an AZO film with excellent optical properties, electrical properties, binding force and the like on substrates such as glass and plastics. The invention provides the preparation method of the AZO film with a simple structure, low cost and excellent performances.

Description

technical field [0001] The invention relates to a method for preparing a transparent conductive film, in particular to a method for preparing an AZO (aluminum-doped zinc oxide) film by using a constrained cathodic arc discharge. Background technique [0002] In modern industry, transparent conductive oxide film (TCO) is widely used, especially as a transparent electrode, it is an indispensable and important raw material for the production of various flat panels, liquid crystal displays and thin film solar cells; due to its low radiation, heat reflection, Anti-static, electromagnetic shielding and other functions can be widely used in construction, instrumentation and other fields; in addition, it can also be used as heating panels, gas sensors, stealth materials, etc. [0003] TCO thin films used in transparent electrodes of flat panel display devices are mainly ITO (In 2 o 3 :Sn) film. However, 1, due to In 2 o 3 The high price leads to high production cost of ITO thin...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/08C23C14/32
Inventor 杨武保吴波
Owner 杨武保