EVA film for packaging high-transmittance solar cell and preparation method thereof
A solar cell, high light transmittance technology, applied in photovoltaic power generation, circuits, adhesives, etc., can solve the problems of strength and toughness enhancement, light transmittance to be improved, etc., to increase strength, improve photoelectric efficiency, and improve light transmittance. Effect
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Embodiment 1
[0035] Commercially available fumed silica was selected as the nucleating antireflection agent. In parts by weight, add 0.1 part of nucleating antireflection agent fumed silica, directly add 0.15 part of tackifier 3-glycidyl etheroxypropyl trimethoxysilane, mix evenly, add 100 parts of EVA pellets and mix Uniformly, then add hindered amine light stabilizer namely 0.1 part of polysuccinic acid (4-hydroxy-2,2,6,6-tetramethyl-1-piperidine ethanol) ester and 0.1 part of bis(2,2, 6,6-Tetramethyl-4-piperidinyl) sebacate, 0.3 part antioxidant?-(3,5-di-tert-butyl-4-hydroxyphenyl) propionate n-octadecyl , 1.3 parts of cross-linking curing agent, that is, a mixture of 2.5-dimethyl-2,5-bis(tert-butylperoxy)hexane and peroxy-2-ethylhexyl tert-butyl carbonate (weight ratio 1:3 ), and mix well. Pour the above mixture into the extruder for blending and extrusion. The temperature is controlled at 90°C. The extruded product is cast, cooled, drawn, and coiled to obtain an EVA film with a thic...
Embodiment 2
[0037]Commercially available fumed silica was grafted and modified as a nucleating antireflection agent, and 3-aminopropyltriethoxysilane was selected as a modifier. In terms of parts by weight, disperse 0.1 part of fumed silica and 0.05 part of modifier in an appropriate amount of toluene, reflux and stir for 2 hours, and then heat up (110°C-120°C) and cure for 2 hours to obtain modified silica Silicon; add 0.15 parts of tackifier 3-glycidyl etheroxypropyl trimethoxysilane and mix evenly, add 100 parts of EVA pellets and mix evenly, then add hindered amine light stabilizer, namely 0.1 part of polysuccinic acid ( 4-Hydroxy-2,2,6,6-tetramethyl-1-piperidinyl ethanol) ester and 0.1 part of bis(2,2,6,6-tetramethyl-4-piperidinyl) sebacate , 0.3 parts of antioxidant?-(3,5-di-tert-butyl-4-hydroxyphenyl) n-octadecyl propionate, add 2 parts of cross-linking curing agent namely 2.5-dimethyl-2,5 - Bis(tert-butylperoxy) hexane and peroxy-2-ethylhexyl tert-butyl carbonate mixture (weight ...
Embodiment 3
[0039] Select high-purity nano-silica (prepared by hydrolysis of silicon tetrachloride) for graft modification as a nucleating anti-reflection agent, and select dimethylvinylmethoxysilane as a modifier. In parts by weight, disperse 0.1 part of high-purity nano-silica and 0.05 part of modifier in toluene, reflux and stir for 2 hours, then heat up (110°C-120°C) and cure for 2 hours to obtain modified high-purity Nano silica; add 0.15 parts of tackifier 3-glycidyl etheroxypropyl trimethoxysilane and mix evenly, add 100 parts of EVA pellets and mix evenly, then add hindered amine light stabilizer, namely 0.1 part of polybutylene Diacid (4-hydroxy-2,2,6,6-tetramethyl-4-piperidinyl ethanol) ester and 0.1 part of bis(2,2,6,6-tetramethyl-4-piperidinyl)decane Diacid ester, 0.3 parts of antioxidant?-(3,5-di-tert-butyl-4-hydroxyphenyl) n-octadecyl propionate, 1.3 parts of cross-linking curing agent, namely 2.5-dimethyl-2 ,5-bis(tert-butylperoxy)hexane and peroxy-2-ethylhexyl tert-butyl ...
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