Stereolithography rapid protoyping photosensitive resin prepared by using polypropylene glycol diglycidyl ether diacrylate as prepolymer, and preparation method for stereolithography rapid protoyping photosensitive resin
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- NANCHANG UNIV
- Publication Date
- 2012-05-02
- Estimated Expiration
- Not applicable · inactive patent
Abstract
Description
Technical field
[0001] The invention belongs to the field of rapid prototyping manufacturing and relates to the use of polypropylene glycol diglycidyl ether diacrylate as a prepolymer and its application in the preparation of stereolithography rapid prototyping photosensitive resin. Background technique
[0002] The emergence of rapid prototyping makes it easy and fast to manufacture complex parts or molds. The commonly used rapid prototyping process is UV laser curing rapid prototyping (commonly known as: stereolithography rapid prototyping). It uses ultraviolet laser to scan the photosensitive resin liquid surface point by point according to the shape of the two-dimensional cross-section to solidify the resin. The cured resin A two-dimensional figure is formed, which is scanned and solidified layer by layer, and finally a complete three-dimensional entity can be obtained. In stereolithography rapid prototyping, the photosensitive resin used is developed on the basis of tr...