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Method for preparing nanoimprint template

A nano-imprinting and template technology, which is applied to the photoplate making process of the pattern surface, optical mechanical equipment, instruments, etc., can solve the problems of failed pattern transfer, inability to realize large-area pattern transfer, and limited application, so as to meet the requirements of large-scale Industrial production, realization of large-area high-precision graphics transfer, simple and convenient production process

Inactive Publication Date: 2012-05-02
HUAZHONG UNIV OF SCI & TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, PAT itself is a hard template, and applying it directly to NIL will encounter problems inherent in conventional hard imprinting, such as 1: Surface impurities will cause failed pattern transfer and cause damage to the initial template; 2: Large-area pattern transfer cannot be achieved on uneven surfaces. In addition, the inherent surface unevenness of PAT itself also limits its application in nanoimprinting.

Method used

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  • Method for preparing nanoimprint template
  • Method for preparing nanoimprint template
  • Method for preparing nanoimprint template

Examples

Experimental program
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Effect test

Embodiment 1

[0031] 1. Rinse the PAT with deionized water repeatedly for 3 to 5 times, and then wash it with N 2 Blow dry with an air gun and bake on the surface of a hot plate at 60°C for 10 minutes. The PAT includes a porous oxide layer and an Al base layer as figure 1 As shown in 2 and 1, the microstructure pattern parameters are: pore depth ~ 600nm, pore diameter ~ 500nm, pore spacing ~ 800nm;

[0032] 2. Spin-coat a layer of photoresist ( figure 1 In 3), this embodiment is preferably SU8-25 series photoresist, and its spin coating parameters are step1: 500r 10s, step2: 2300r 30s. Then bake on a hot plate, the baking parameters are step1: 75°C for 3 minutes, step2: 105°C for 7 minutes. Then stick a layer of double-sided adhesive ( figure 1 In 4), the double-sided adhesive tape is transparent to ultraviolet rays and has strong adhesion. Then the other side of the above-mentioned double-sided adhesive is adhered to quartz glass ( figure 1 Middle 5) The surface is subjected to embos...

Embodiment 2

[0038] 1. Rinse the PAT with deionized water repeatedly for 3 to 5 times, and then wash it with N 2 Blow dry with an air gun and bake on the surface of a hot plate at 60°C for 10 minutes, then use perfluorooctyltrichlorosilane CF 3 (CF 2 ) 5 (CH 2 ) 2 SiCl 3 or perfluoroquinyltrichlorosilane CF 3 (CF 2 ) 7 (CH 2 ) 2 SiCl 3 Silane molecules containing Si≡X (wherein X is a halogen element) chemical bond are self-assembled on the surface of the PAT by a single-molecule anti-adhesive layer by vacuum heating and volatilization deposition. The pattern parameters of the PAT microstructure are the same as in Example 1. The method of making the self-assembled monomolecular anti-adhesive layer adopted in this embodiment may also be a liquid-phase self-assembled anti-adhesive method;

[0039] 2. Spin-coat a layer of SU8-2 series photoresist ( figure 1 In 3), the spin coating parameters are step1: 500r 10s, step2: 2000r 30s. Then bake on a hot plate, the baking parameters ar...

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Abstract

The invention discloses a method for preparing nanoimprint template, which comprises the following steps of: (1) coating a buffering layer on the surface of porous anode alumina template (PAT) in a rotation manner; (2) sticking a gluing layer on the buffering layer; (3) sticking a hard substrate on the gluing layer; (4) pressing; (5) removing the AL substrate; and (6) etching the template by a two-step drying method. The method for preparing nanoimprint template provided by the invention adopts the porous anode alumina template as the initial template; the prepared four-layer nanoimprint template has self-adaption function; the preparing method can overcome influence of particles on surface and uneven pressing in normal nanometer pressing and realize large-area high-precision graph shifting; meanwhile, the porous layer on the PAT surface can be peeled off to the surface of the substrate conveniently and completely after pressing due to the special structure and preparation process; therefore, the duplicating functions of hole-shaped and columnar graphs can be realized; in addition, the method is featured with cheap and easily got raw material, simple and convenient preparation process and capability of satisfying needs of large-scale industrial production.

Description

technical field [0001] The invention relates to a method for preparing a template, in particular to a method for preparing a template for nanoimprinting. Background technique [0002] The development of the semiconductor manufacturing industry relies on the improvement of low-cost micro-pattern structure transfer technology, but with the continuous reduction of the feature size of the pattern, the traditional photolithography technology based on the wavelength of light is gradually unable to do what it wants. Nanoimprinting (NIL) is a method that directly uses mechanical contact extrusion to redistribute the imprinted material between the template and the substrate. Compared with traditional lithography technology, it has the characteristics of high resolution; compared with high-resolution focused ion beam lithography, electron beam lithography, X-ray lithography and other technologies, it has high yield, low cost, It can be mass-produced and other characteristics, so it h...

Claims

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Application Information

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IPC IPC(8): G03F7/00
Inventor 孙堂友徐智谋刘文徐晓丽李程程赵文宁罗敏
Owner HUAZHONG UNIV OF SCI & TECH
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