Laminate and process for production thereof

A technology of laminates and composition ratios, applied in chemical instruments and methods, coatings, layered products, etc., can solve the problems of optical applications that cannot be applied with precision, cannot obtain high refractive index, control refractive index, etc., and achieve productivity. Excellent, excellent controllability of refractive index, high refractive index effect

Inactive Publication Date: 2012-05-23
MITSUI CHEM INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, when the silicon nitride film is provided on the surface of the optical member, since the optical member itself is exposed to high temperature, the method described in this document cannot be applied to optical applications requiring precision.
On the other hand, when the polysilazane film is heated at a temperature lower than 600°C, it is converted into silica with a low refractive index, and a high refractive index film cannot be obtained.
In addition, the method described in Patent Document 3 is difficult to arbitrarily control the refractive index according to the application.

Method used

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  • Laminate and process for production thereof
  • Laminate and process for production thereof
  • Laminate and process for production thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0198] A 2 wt % xylene (dehydrated) solution of polysilazane (NL110A, manufactured by AZ Electronic Materials Co., Ltd.) was spin-coated (10 s, 3000 rpm) on a silicon substrate (thickness 530 μm, manufactured by Shin-Etsu Chemical Co., Ltd.). , and dried at 120° C. for 10 minutes to produce a polysilazane film with a thickness of 0.025 μm. Drying is carried out in an atmosphere with a water vapor concentration of about 500 ppm.

[0199] This polysilazane film was subjected to vacuum plasma treatment under the following conditions.

[0200] Vacuum plasma processing device: U-TEC Co., Ltd.

[0201] Gas: Ar

[0202] Gas flow: 50mL / min

[0203] Pressure: 19Pa

[0204] Temperature: room temperature

[0205] Applied power per electrode unit area: 1.3W / cm 2

[0206] Frequency: 13.56MHz

[0207] Treatment application: 5min

Embodiment 2

[0209] A 2 wt% xylene (dehydrated) solution of polysilazane (NN110A, manufactured by AZ Electronic Materials Co., Ltd.) without adding a catalyst was spin-coated (10s, 3000 rpm) on a silicon substrate (thickness 530 μm, manufactured by Shin-Etsu Chemical Co., Ltd.) , dried under the same conditions as in Example 1 to produce a polysilazane film with a thickness of 0.025 μm.

[0210] Then, vacuum plasma treatment was performed under the same conditions as in Example 1.

Embodiment 3

[0212] A 2 wt % xylene (dehydrated) solution of polysilazane (NL110A, manufactured by AZ Electronic Materials Co., Ltd.) was bar-coated on a polyethylene terephthalate (PET) film (thickness 50 μm, "A4100" Toyobo Co., Ltd.) was dried under the same conditions as in Example 1 to produce a polysilazane film with a thickness of 0.1 μm.

[0213] Then, vacuum plasma treatment was performed under the same conditions as in Example 1.

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Abstract

A laminate comprising a base material and a silicon-containing film formed on the base material, wherein the silicon-containing film has a nitrogen-rich region composed of a silicon atom and a nitrogen atom or a silicon atom, a nitrogen atom and an oxygen atom, and wherein the nitrogen-rich region is formed by irradiating a polysilazane film that has been formed on the base material with an energy ray in an atmosphere where oxygen or water vapor is not contained substantially to thereby modify at least a part of the film; and a process for producing the laminate.

Description

technical field [0001] The present invention relates to a laminate and a method for producing the same. Background technique [0002] In recent years, transparent gas barrier materials that block gases such as oxygen and water vapor have been used not only for packaging materials such as food and pharmaceuticals, which have been the main application until now, but also for flat panel displays (FPDs) such as liquid crystal displays, and components for solar cells (substrates, back sheets, etc.), flexible substrates or sealing films for organic electroluminescence (organic EL) elements, etc. In these uses, very high gas barrier properties are required. [0003] At present, transparent gas barrier materials used in some applications are produced by dry methods such as plasma CVD, sputtering, and ion plating, and wet methods typified by sol-gel methods. Both methods are methods of depositing silicon oxide (silicon dioxide) exhibiting gas barrier properties on a plastic substra...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B32B9/00B32B27/00C08J7/043C08J7/046C08J7/048
CPCC08J2483/16C09D183/16C08G77/62C08J7/047Y10T428/265C08J7/0427C08J7/048C08J7/043C08J7/046B32B27/08B32B27/16B32B9/00G02B1/10
Inventor 高木斗志彦福本晴彦
Owner MITSUI CHEM INC
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