Cleaning solution composition

Abstract

The invention provides a cleaning solution composition used for cleaning a developing trough. The composition comprises (A) 1 to 40 wt% of an alkali metal alkaline compound, (B) 0.3 to 20 of a nonionic surfactant, (C) a chelating agent and (D) water. The cleaning solution composition provided in the invention is applicable to cleaning of a developing trough and pipelines in photoetching of a color filter, can improve a cleaning effect on the developing trough and the pipelines and enables reverse adhesion of a photoresist or affection of the photoresist on pattern making in the process of development to be avoided, a color filter glass substrate to have stable quality after development, a qualified rate in photoetching to be improved and cost to be reduced.

Description

technical field [0001] The invention relates to a cleaning liquid composition, especially a cleaning liquid composition suitable for cleaning a developing tank and its pipeline. Background technique [0002] In the semiconductor and optoelectronic industries, the layout of various components and circuits on the semiconductor chip is generally realized through lithography processes. In the semiconductor photolithography process, the photoresist is evenly coated on the substrate, and then the pattern is formed on the substrate through the steps of soft baking, mask alignment, exposure, post-exposure baking, development and hard baking. photoresist layer. However, in the conventional developing process, when the dissolved photoresist accumulates in the developing solution, insoluble organic substances will initially be formed in the developing tank and pipelines, and finally water-insoluble residues or residues will be formed. In addition, if the photoresist is used to prepar...

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Problems solved by technology

However, in the conventional developing process, when the dissolved photoresist accumulates in the developing solution, insoluble organic substances will initially be formed in the developing tank and pipelines, and finally water-insoluble residues or residues will be formed

In addition, if the photoresist is used to prepare color filters, it is easier to add additives such as disperse dyes, pigment particles, coupling agents, various photoinitiators or unsaturated multifunctional monomers to the photoresist. Residue after development in the non-exposed area, for example, may include resin or pigment residue, resulting in unacceptable defects such as hue change

[0003] On the other hand, during the color photoresist coating process, some photoresist residues will remain on the coating machine, and these accumulated photoresist residues will also enter the developer tank or pipeline through the developer recovery system , leading to the adhesion of the photoresist residue, which in turn affects the development process

Therefore, the residues accumulated during development will cause water-insoluble residues such as dissolved pigment particles or other components in the developing tank or pipeline to deposit on the substrate or photoresist coating film, resulting in residues on the color filter. Debris, surface contamination, etc.

[0004] In view of this, existing documents have proposed improved methods, such as Japanese Patent No. 2009062408, which discloses a water-based cleaning solution composition for cleaning color filter process pipelines and equipment. The composition includes alkanesulfonate ionic surface As an active agent, organic solvents need to be added to improve solubility, and it also has the disadvantages of strong foaming and easy-dissolving process pipelines

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