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Method for realizing nanominiaturization of metal material surface crystal grain

A metal material, micro-nano technology, applied in the field of material processing, can solve the problems of high internal stress, unfavorable material corrosion resistance, large surface roughness of nano-layer, etc., and achieve the effect of excellent comprehensive performance

Inactive Publication Date: 2012-07-11
SHANGHAI UNIV OF ENG SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, the ultrasonic shot peening method is based on the principle of large plastic deformation to refine the grains, so the generated nano-layer has a large surface roughness and high internal stress, which is easy to peel off, which is not conducive to the corrosion resistance of the material.

Method used

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  • Method for realizing nanominiaturization of metal material surface crystal grain
  • Method for realizing nanominiaturization of metal material surface crystal grain
  • Method for realizing nanominiaturization of metal material surface crystal grain

Examples

Experimental program
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Effect test

Embodiment 1

[0016] In this example, the typical and widely used hypoeutectoid 45# carbon steel is selected as the research material, and its chemical composition is C: 0.4~0.5wt / %, Si: ≤0.35wt / %, Mn: ≤0.40wt / %, S: ≤0.030wt / %, P: ≤0.035wt / %, the rest is iron.

[0017] After the sample is conventionally quenched and tempered (heated to 780°C for 30 minutes, water quenched, and tempered at 200°C for 5 hours), it is processed into a sample of 15mm×10mm×5mm, and cold rolled on a rolling mill by 30% to 50%. Then mechanically ground and polished to roughness R a ≈0.07μm, wash with acetone;

[0018] Place the sample in the above-mentioned high-current pulsed electron beam device, and evacuate to 10 -3 ~10 -4 Pa, and then electron beam bombardment treatment, the processing parameters are as follows: accelerating voltage 18 ~ 25kV, target source distance 80 ~ 160mm, magnetic field strength 800 ~ 1200Oe, energy density 3 ~ 5J / cm 2 , The number of pulses is 2 to 25 times, and the time interval of...

Embodiment 2

[0021] In this example, 316L stainless steel, a typical medical metal material, is selected as the research material, and its chemical composition is: C: 0.02wt%, Cr: 16-18wt%, Ni: 12-15wt%, Mn: 1.63wt%, Mo: 2wt%, Si 0.41wt%, P 0.02wt%, S: 0.03wt%, and the rest is iron.

[0022] The 316L steel sample is made into 20×10×4mm thin slices, which are cold rolled by 40% to 60% on a rolling mill, and the surface is ground and polished to roughness R a ≈0.07μm, washed with acetone;

[0023] Place the sample in the above-mentioned high-current pulsed electron beam device, and evacuate to 10 -3 ~10 -4 Pa, and then electron beam bombardment treatment, the processing parameters are as follows: accelerating voltage 20 ~ 25kV, target source distance 80 ~ 160mm, magnetic field strength 800 ~ 1200Oe, energy density 2 ~ 4J / cm 2 , The number of pulses is 2 to 25 times, and the time interval of each pulse is about 5 to 20s.

[0024] figure 2 It is the surface morphology of 316L stainless s...

Embodiment 3

[0026] In this embodiment, a typical and widely used medical alloy material NiTi alloy is selected as the research material, and its chemical composition is Ni: 50.6wt%, Ti: 49.4wt%.

[0027] The NiTi alloy sample is made into a 20×10×4mm thin sheet, which is cold rolled by 40% to 60% on a rolling mill, and the surface is ground and polished to a roughness of R a ≈0.07m, wash with acetone;

[0028] Place the sample in the above-mentioned high-current pulsed electron beam device, and evacuate to 10 -3 ~10 -4 Pa, and then electron beam bombardment treatment, the processing parameters are as follows: accelerating voltage 18 ~ 23kV, target source distance 80 ~ 160mm, magnetic field strength 800 ~ 1200Oe, energy density 2 ~ 4J / cm 2 , The number of pulses is 2 to 20 times, and the time interval of each pulse is about 5 to 20s.

[0029] image 3 It is the surface backscattering diffraction morphology of the NiTi alloy sample after 5 pulse treatments. It can be clearly seen that f...

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Abstract

The invention discloses a method for realizing the nanominiaturization of a metal material surface crystal grain, which comprises the following steps of: (1) cold-rolling a metal matrix, polishing the surface till the roughness is 0.06-0.08 mum and cleaning; and (2) putting the metal matrix treated in the step (1) into a strong flow pulse electronic beam device, vacuum-pumping to 10-3-10-4 Pa, bombarding the surface of the metal matrix by adopting a pulse electronic beam with an energy density of 2-4 J / cm<2> and controlling the pulse duration at each time within 0.5-1 microsecond, the bombardment number within 2-30 and the pulse time interval at each time within about 5-20 seconds. The method has the beneficial effect that by utilizing the characteristic that the surface of a deformable material is quickly tempered by the pulse electronic beam, the metal surface crystal grain is refined, so that the size of the surface crystal grain is reduced to 100-500 nanometers, thereby the excellent surface performance is obtained.

Description

technical field [0001] The invention belongs to the technical field of material processing, and in particular relates to a method for realizing micro-nano crystal grains on the surface of metal materials. Background technique [0002] The surface modification technology of pulsed high-energy beam metal materials is a new development trend in the field of surface technology, and it has many advantages that traditional surface treatment does not have. The use of high-current pulsed electron beams to modify the surface of materials is a new technology developed in the past ten years, which is characterized by simple equipment and reliable operation. Pulsed electron beams have high instantaneous energy, short action time, and deep modification layer when interacting with the surface of materials. Therefore, they have been used in surface strengthening, surface cleaning, and surface alloying of materials, and have broad application prospects. Nisshin Corporation of Japan is brin...

Claims

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Application Information

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IPC IPC(8): C21D8/00C21D1/09
Inventor 张可敏邹建新
Owner SHANGHAI UNIV OF ENG SCI
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