Gold micro-nano composite structure array and preparation method thereof
A composite structure and array technology, applied in the direction of microstructure technology, microstructure devices, manufacturing microstructure devices, etc., can solve the problems of Raman signal inhomogeneity, uncertainty, inconsistency, etc., to eliminate interference peaks and improve the preparation process easy effect
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[0024] Example 1
[0025] The specific steps of preparation are:
[0026] Step 1, prior to ion sputtering or vacuum evaporation deposition of a layer of gold film on the substrate; wherein the substrate is conductive glass in the conductor substrate. Then, a single-layer colloidal crystal template consisting of polystyrene colloidal spheres with a diameter of 2000 nm was placed on a substrate covered with a gold film.
[0027] In step 2, the substrate covered with the gold film and the single-layer colloidal crystal template was first heated at 100° C. for 10 min. Then put it in a chloroauric acid solution with a concentration of 0.3g / L, use it as the working electrode, and the deposition current density is 0.03mA / cm 2 (or 0.15mA / cm 2 ) for 8 h; wherein, the temperature during electrodeposition is 13° C., and the counter electrode during electrodeposition is a graphite electrode, thereby obtaining a composite array. The composite array was then placed in a dichloromethane ...
Example Embodiment
[0028] Example 2
[0029] The specific steps of preparation are:
[0030] Step 1, prior to ion sputtering or vacuum evaporation deposition of a layer of gold film on the substrate; wherein the substrate is conductive glass in the conductor substrate. Then, a single-layer colloidal crystal template consisting of polystyrene colloidal spheres with a diameter of 2000 nm was placed on a substrate covered with a gold film.
[0031] In step 2, the substrate covered with the gold film and the single-layer colloidal crystal template was first heated at 105° C. for 7.5 min. Then put it in the chloroauric acid solution with a concentration of 0.4g / L, and use it as the working electrode, and the deposition current density is 0.035mA / cm 2 (or 0.23mA / cm 2 ) for 6.5 h; wherein, the temperature during the electrodeposition is 15° C., and the counter electrode during the electrodeposition is a graphite electrode to obtain a composite array. The composite array was then placed in a dichlor...
Example Embodiment
[0032] Example 3
[0033] The specific steps of preparation are:
[0034] Step 1, prior to ion sputtering or vacuum evaporation deposition of a layer of gold film on the substrate; wherein the substrate is conductive glass in the conductor substrate. Then, a single-layer colloidal crystal template consisting of polystyrene colloidal spheres with a diameter of 2000 nm was placed on a substrate covered with a gold film.
[0035]In step 2, the substrate covered with the gold film and the single-layer colloidal crystal template was first heated at 110° C. for 5 minutes. It was then placed in a chloroauric acid solution with a concentration of 0.5g / L, and it was used as the working electrode, and the deposition current density was 0.04mA / cm 2 (or 0.3mA / cm 2 ) for 5 h; wherein, the temperature during electrodeposition is 18° C., and the counter electrode during electrodeposition is a graphite electrode, thereby obtaining a composite array. The composite array was then placed in ...
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