Preparation method of CdZnTe thin-film ultraviolet light detector
A technology of ultraviolet light and detectors, applied in semiconductor devices, final product manufacturing, sustainable manufacturing/processing, etc., to achieve low cost, improve device responsivity, and control device leakage current effects
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Embodiment 1
[0025] The preparation process and steps of this embodiment are as follows:
[0026] (a) Preparation of the sublimation source: According to the known prior art, under high vacuum, high-purity Cd, Zn, Te simple substances are transformed from liquid to solid at a crystallization point in the temperature gradient region of the Bridgman furnace, CdZnTe crystals with good quality, relatively uniform composition distribution, and a zinc molar content of 5% were grown, and sliced as a sublimation source;
[0027] (b) Substrate pretreatment: use glass coated with a transparent conductive layer FTO as the substrate, and ultrasonically clean the substrate with deionized water, acetone and ethanol for 15 minutes respectively to remove impurities and organic substances on the surface, dry and put Into the close space sublimation reaction chamber;
[0028] (c) Growth process: Turn on the mechanical pump to evacuate the sublimation chamber to below 3Pa, then turn off the mechanical...
Embodiment 2
[0032] The preparation process and steps of this embodiment are as follows:
[0033] (a) Preparation of the sublimation source: According to the known prior art, under high vacuum, high-purity Cd, Zn, Te simple substances are transformed from liquid to solid at a crystallization point in the temperature gradient region of the Bridgman furnace, CdZnTe crystals with good quality, relatively uniform composition distribution, and a zinc molar content of 5% were grown, and sliced as a sublimation source;
[0034] (b) Substrate pretreatment: use glass coated with a transparent conductive layer FTO as the substrate, and ultrasonically clean the substrate with deionized water, acetone and ethanol for 15 minutes respectively to remove impurities and organic substances on the surface, dry and put Enter the close-space sublimation reaction chamber.
[0035] (c) Growth process: Turn on the mechanical pump to evacuate the sublimation chamber to below 3Pa, then turn off the mechanica...
Embodiment 3
[0039] The preparation process and steps of this embodiment are as follows:
[0040] (a) Preparation of the sublimation source: According to the known prior art, under high vacuum, high-purity Cd, Zn, Te simple substances are transformed from liquid to solid at a crystallization point in the temperature gradient region of the Bridgman furnace, CdZnTe crystals with good quality, relatively uniform composition distribution, and a zinc molar content of 5% were grown, and sliced as a sublimation source;
[0041] (b) Substrate pretreatment: use glass coated with a transparent conductive layer FTO as the substrate, and ultrasonically clean the substrate with deionized water, acetone and ethanol for 15 minutes respectively to remove impurities and organic substances on the surface, dry and put Enter the close-space sublimation reaction chamber.
[0042] (c) Growth process: Turn on the mechanical pump to evacuate the sublimation chamber to below 3Pa, then turn off the mechanica...
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