Organic LED (light-emitting diode)
A light-emitting diode and organic technology, which is applied in the manufacture of electrical components, electrical solid devices, semiconductor/solid devices, etc., can solve the problem that the spectral stability has not been fundamentally solved, the complexity of device preparation, spectral instability, etc. problem, to achieve the effect of high color rendering index, simplified structure, and stable luminescent spectrum
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
preparation example Construction
[0059] The present invention has no special limitation on the preparation method of the organic light-emitting diode, and the present invention preferably adopts the following method for preparation, specifically:
[0060] First, the ITO anode layer 2 on the ITO glass is photoetched into thin strip electrodes, then cleaned, dried with nitrogen, treated with oxygen plasma for 1~5min, and baked in a vacuum oven at 120°C for 0.5~1h, and then transferred to In the vacuum coating system, wait for the vacuum degree to reach 1~5×10 -4 At Pa, the hole interface layer 3, the hole transport layer 4, the light-emitting layer 5, the electron transport layer 6, the electron interface layer 7 and the cathode 8 are sequentially evaporated on the ITO anode layer 2, wherein the two electrodes intersect each other to form a device The light-emitting area, the area of the light-emitting area is 16mm 2 , the thickness of the hole interface layer 3 is 2~20nm, the thickness of the hole transport...
Embodiment 1
[0064] First, the ITO anode 2 on the glass substrate 1 is photolithographically formed into an electrode of 4 mm × 30, then cleaned, blown dry with nitrogen, placed the glass in a vacuum oven and baked at 120°C for 30 minutes, treated with oxygen plasma for 2 minutes, and then Put the glass into the vacuum coating system. When the vacuum degree of the vacuum coating system reaches 1~5×10 -4 Pa, sequentially vapor-deposit MoO on the ITO anode 2 3 Hole interface layer 3, TAPC hole transport layer 4, red phosphorescent dye (PPQ) 2 Ir (acac) and green phosphorescent dye (ppy) 2 Ir(acac)-doped electron transport material Be(PP) 2 luminescent layer 5, Be(PP) 2 The electron transport layer 6 of LiF, the electron interface layer 7 of LiF and the cathode 8 of metal Al, wherein the two electrodes intersect with each other form the light emitting area of the device, and the area of the light emitting area is 16mm 2 , the thicknesses of hole interface layer 3, hole transport laye...
Embodiment 2
[0067] First, the ITO anode 2 on the glass substrate 1 is photolithographically formed into an electrode of 4mm×30mm, then cleaned, blown dry with nitrogen gas, placed the glass in a vacuum oven and baked at 120°C for 30min, treated with oxygen plasma for 2min, and then put The glass is placed in a vacuum coating system. When the vacuum degree of the vacuum coating system reaches 1 to 5×10 -4 Pa, sequentially vapor-deposit MoO on the ITO anode 2 3 Hole interface layer 3, TAPC hole transport layer 4, red phosphorescent dye (PPQ) 2 Ir(acac) and green phosphorescent dye Ir(ppy) 3 Emitting layer of doped electron transport material Be(PP)2 5, Be(PP) 2 The electron transport layer 6 of LiF, the electron interface layer 7 of LiF and the cathode 8 of metal Al, wherein two electrodes intersect with each other to form the light-emitting area of the device, the area of the light-emitting area is 16 square millimeters, the hole interface layer 3, the hole transport layer 4. The t...
PUM
Login to View More Abstract
Description
Claims
Application Information
Login to View More 