Photo-curable thermosetting resin composition, photo-curable thermosetting film, condensate, and printed circuit board including condensate
A resin composition, thermosetting technology, applied in the direction of printed circuit, printed circuit manufacturing, printed circuit secondary treatment, etc., to achieve the effect of excellent electrical insulation and excellent operability
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Embodiment 1~6
[0273] The performance evaluation and property evaluation of the composition of the Example and the comparative example shown in Table 1 were performed by the evaluation method shown below. The evaluation results are shown in Table 2.
[0274] Performance evaluation:
[0275]
[0276] A circuit pattern substrate with a copper thickness of 18 μm was subjected to a copper surface roughening treatment (Mec etch Bond CZ-8100 manufactured by Mec Corporation), washed with water, dried, and then coated with the substrates shown in Table 1 on the entire surface by the screen printing method. The compositions of Examples and Comparative Examples were dried in a hot air circulation drying oven at 80° C. for 60 minutes to obtain a dry coating film of about 20 μm. Then, using an exposure device equipped with a high-pressure mercury lamp, exposure was performed with a step exposure meter (Kodak No. 2), and the remaining amount of the step exposure sheet after developing (30°C, 0.2MPa, 1...
Embodiment 7~12
[0321] The cover film was peeled off from the dry film obtained as described above, and the film was thermocompression-bonded to a patterned copper foil substrate, followed by exposure under the same conditions as the substrate used for the evaluation of the above-mentioned coating film properties. After the exposure, the carrier film was peeled off, and developed with a 1% sodium carbonate aqueous solution at 30° C. for 90 seconds under a spray pressure of 0.2 MPa to obtain a resist pattern. Through the UV conveyor belt furnace, the cumulative exposure is 1000mJ / cm 2 After irradiating the substrate with ultraviolet rays under certain conditions, it was cured by heating at 150° C. for 60 minutes. Using the above-mentioned evaluation method, performance evaluation and property evaluation were performed on the obtained test substrate having a cured film. The evaluation results are shown in Table 3.
[0322] [table 3]
[0323]
[0324] From the results shown in Table 2 and...
Embodiment 13~20
[0374] Using the resin solution in the above synthesis example, the various components and ratios (parts by mass) shown in Table 4 were mixed, pre-mixed with a mixer, and then kneaded with a 3-roller mill to prepare a photosensitive resin for solder resist. resin composition. Here, the degree of dispersion of the obtained photosensitive resin composition was evaluated by particle size measurement with a blade fineness meter manufactured by ERICH SEN, and it was 15 μm or less.
[0375] In addition, in Table 4, the compositions of Comparative Examples 4 and 6 are the same compositions as those of Comparative Examples 1 and 2 in Table 1, respectively.
[0376] [Table 4]
[0377]
[0378] [Remark]
[0379] *1~*12: Same as Table 1 [Remarks].
[0380] The performance evaluation and characteristic evaluation were performed about the composition of the Example and the comparative example shown in Table 4. The evaluation results are shown in Table 5. In addition, since the ev...
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