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Preparation method of titanium dioxide based selective absorbing thin film

A selective absorption and titanium dioxide technology, applied in solid-state chemical plating, metal material coating technology, optics, etc., can solve the problems of high cost, increased control difficulty, complex process, etc., and achieve low cost, simple equipment, and low radiation performance Effect

Inactive Publication Date: 2013-01-23
ZHEJIANG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, this type of film system has a multi-layer film structure, the process is complicated, the control difficulty is increased, and the cost is high

Method used

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  • Preparation method of titanium dioxide based selective absorbing thin film
  • Preparation method of titanium dioxide based selective absorbing thin film
  • Preparation method of titanium dioxide based selective absorbing thin film

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0025] 1) Cleaning the quartz substrate: soak the quartz substrate in deionized water for 2h→ultrasonic oscillation washing for 15min→volume fraction 15% hydrochloric acid for 2h→ultrasonic oscillation washing for 15min→acetone immersion for 1h→ultrasonic oscillation for 15min→ethanol immersion for 1h→ultrasonic oscillation Wash for 15min→store in ethanol for later use;

[0026] 2) Stir tetrabutyl titanate and acetylacetone uniformly, and the molar ratio of acetylacetone to tetrabutyl titanate is 0.5 to obtain solution A;

[0027] Put PEG-2000, acetic acid and water into ethanol, stir and mix to obtain solution B; the mass ratio of PEG-2000 to tetrabutyl titanate is 1.0, the molar ratio of acetic acid to tetrabutyl titanate is 0.2, and water and The molar ratio of tetrabutyl titanate is 4;

[0028] 3) Add the B solution in step 2) dropwise to the A solution, stir and mix uniformly, and use ethanol as a solvent to prepare a sol with a tetrabutyl titanate concentration of 0.25 mol / L; ...

Embodiment 2

[0037] 1) Cleaning the quartz substrate: soak the quartz substrate in deionized water for 2h→ultrasonic oscillation washing for 15min→volume fraction 15% hydrochloric acid for 2h→ultrasonic oscillation washing for 15min→acetone immersion for 1h→ultrasonic oscillation for 15min→ethanol immersion for 1h→ultrasonic oscillation Wash for 15min→store in ethanol for later use;

[0038] 2) Stir tetrabutyl titanate and dimethylformamide uniformly, and the molar ratio of dimethylformamide to tetrabutyl titanate is 0.2 to obtain solution A;

[0039] Put PVP-K30, salicylic acid and water into ethanol, stir and mix to obtain B solution; the mass ratio of PVP-K30 to tetrabutyl titanate is 0.5, and the molar ratio of salicylic acid to tetrabutyl titanate is 1.0, the molar ratio of water to tetrabutyl titanate is 2;

[0040] 3) Add the B solution in step 2) dropwise to the A solution, stir and mix uniformly, and use ethanol as the solvent to prepare a sol with a tetrabutyl titanate concentration of...

Embodiment 3

[0049] 1) Cleaning the quartz substrate: soak the quartz substrate in deionized water for 2h→ultrasonic oscillation washing for 15min→volume fraction 15% hydrochloric acid for 2h→ultrasonic oscillation washing for 15min→acetone immersion for 1h→ultrasonic oscillation for 15min→ethanol immersion for 1h→ultrasonic oscillation Wash for 15min→store in ethanol for later use;

[0050] 2) Stir tetrabutyl titanate and acetylacetone uniformly, and the molar ratio of acetylacetone to tetrabutyl titanate is 1.0 to obtain solution A;

[0051] Put PVP-K30, ammonia and water into ethanol, stir and mix to obtain solution B; the mass ratio of PVP-K30 to tetrabutyl titanate is 2.0, the molar ratio of ammonia to tetrabutyl titanate is 0.05, and water and The molar ratio of tetrabutyl titanate is 10;

[0052] 3) Add the B solution in step 2) dropwise to the A solution, stir and mix uniformly, and use ethanol as the solvent to prepare a sol with a tetrabutyl titanate concentration of 0.01 mol / L;

[0053...

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Abstract

The invention relates to a preparation method of a titanium dioxide based selective absorbing thin film; according to the method, the thin film is plated on a substrate by using a sol-gel method, then the thin film is thermally treated under a high-volume condition in order to enable the organisms in a thin film precursor to carbonize partially or completely, as a result, a conductive network and independent carbon particles are formed in a TiO2 substrate; the obtained titanium dioxide based thin film has higher selectively spectrum absorbency (namely absorbency in a visible spectrum area) and has higher reflectivity in a middle-far infrared area. The preparation method is simple in process, does not need any expensive equipment, is low in cost, can coat the film on the substrate in any shape, and is beneficial for large-scale industrial production.

Description

Technical field [0001] The invention relates to a method for preparing a titanium dioxide-based selective absorption film, in particular to a preparation method for a solar spectrum selective absorption film. Background technique [0002] The solar spectrum selective absorption film requires high absorptivity in the 300nm-3000nm band, which can convert solar energy into heat energy, and at the same time, it has a high reflectivity in the mid- and far-infrared band to reduce heat loss caused by its own thermal radiation. Since the emissivity of the material in the mid-to-far infrared band is the result of the interaction of free carriers and electromagnetic waves, the emissivity is directly related to the conductivity of the film. The traditional selective absorption film widely adopts a tandem structure, that is, a dielectric material film is plated on a metal substrate, the metal has a higher electrical conductivity to obtain a low emissivity, and the dielectric material film is...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C20/08G02B1/10
Inventor 刘涌王慷慨王菊宋晨路韩高荣杨振辉苏婷
Owner ZHEJIANG UNIV
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