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Method for producing quartz glass crucible having transparent inner layer made of synthetically produced quartz glass

A quartz glass crucible and quartz glass technology, which is applied in glass forming, manufacturing tools, glass manufacturing equipment, etc., can solve the problems of being unable to withstand high temperature and low viscosity for a long time

Active Publication Date: 2013-01-30
SHIN ETABU QUARTZ PRODS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, depending on the production situation, this quartz glass contains a high content of hydroxyl groups, which results in a relatively low viscosity
Therefore, the crucible cannot withstand high temperature for a long time during the crystal drawing process

Method used

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  • Method for producing quartz glass crucible having transparent inner layer made of synthetically produced quartz glass
  • Method for producing quartz glass crucible having transparent inner layer made of synthetically produced quartz glass

Examples

Experimental program
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example 1

[0068] Next, the crucible base body 20 is introduced together with the porous soot layer 21 into a vacuum furnace, where a two-step drying and vitrification process is carried out. To dry the soot layer 21 , the vacuum furnace is heated at atmospheric pressure to a temperature of 750° C. and flushed there with drying gas. The drying gas consisted of a gas mixture of chlorine and nitrogen with a chlorine content of 5% by volume. After 2 hours of treatment, the vacuum furnace was evacuated to an absolute pressure of less than 300 mbar and heated to a temperature of 1400°C. At this temperature, the soot layer 21 is sintered into a bubble-free, transparent, and high-purity inner layer. Subsequently, a layer thickness of approximately 0.1 mm is removed from the sintered layer by etching in hydrofluoric acid.

[0069] The inner layer of the quartz glass crucible thus produced had a median thickness of 3 mm. This inner layer is smooth and free of bubbles and is fixedly connected t...

example 2

[0071] In an alternative vitrification method, after the crucible base 20 and the porous soot layer 21 are dried in a vacuum oven (as described above), the 2 The laser (TLF 3000 Turbo type), at a maximum beam power of 3 kW, was vitrified at the focal point. The laser is equipped with a beam guidance system that allows robot-controlled beam guidance in all spatial directions. The primary beam of the laser beam is diverged by an astigmatism device (Aufweitoptik), so that a focal spot with a diameter of 30 mm is formed on the soot layer 21 . Starting from the central bottom region of the crucible base body 20, the laser beam is directed through the soot layer 21 in a helical motion to the upper edge 26 of the soot layer (see figure 2 ). At this point, the soot layer 21 is sequentially vitrified, wherein the laser beam drives ahead of the laser beam the melting front as well as the gas present in the soot layer 21 , which gas can escape from the ashes at the upper edge 26 at th...

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Abstract

The aim of the invention is to provide a method for producing a quartz glass crucible which has an inner layer made of transparent, low-void and pure quartz glass and a long service life. Said aim is achieved according to the invention by a method comprising the following steps: (a) providing a crucible main body made of quartz glass having an inner face, (b) generating a porous SiO2 soot layer on at least a portion of the inner face of the crucible main body by means of chemical vapor deposition, drying the porous SiO2 soot layer in order to reduce the hydroxyl group content, and sintering the soot layer to the inner layer made of transparent quartz glass in a low-hydrogen atmosphere, such that a hydroxyl group content of less than 100 ppm by weight develops in the quartz glass of the inner layer.

Description

[0001] The invention relates to a method for producing a quartz glass crucible with a transparent inner wall made of synthetic quartz. [0002] Quartz glass crucibles are mainly used to accommodate molten semiconductors produced during the drawing of single crystals, especially silicon single crystals, by the so-called Czochralski method. The walls of such quartz glass crucibles are generally formed by an opaque outer layer, which is provided with a transparent, as far as possible bubble-free, quartz glass inner layer. [0003] The transparent inner layer is in contact with the melt during the drawing process and is under high mechanical, chemical and thermal load. Bubbles remaining in the inner layer grow under the action of temperature and pressure and may eventually rupture, thereby creating fractured parts and impurities in the melt, thus resulting in a lower yield of dislocation-free silicon single crystals. [0004] In order to reduce the corrosive attack on the melt and ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C03B19/09C03B19/14C03C17/02
CPCC03C23/0025C03B19/1453C03C17/004C03B19/095C03B19/1492C03C21/003C03C2218/1525C03B19/14C03C2217/213C03C17/02
Inventor W.莱曼T.凯泽M.特罗默C.纳萨罗夫
Owner SHIN ETABU QUARTZ PRODS
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