Sapphire polishing solution and preparation method thereof

A preparation method and polishing liquid technology, applied to polishing compositions containing abrasives, etc., can solve the problems of particles remaining on the sapphire surface, troublesome process, high cost, etc., and achieve the advantages of saving preparation time, long storage time and low requirements Effect

Inactive Publication Date: 2013-02-06
长治虹源科技晶片技术有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] The sapphire polishing liquid currently on the market mainly uses silica sol as the raw material for the preparation of the polishing liquid, which uses a large amount of organic additives. The high cost

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0027] Weigh 30 grams of sodium silicate and 20 grams of ethylenediaminetetraacetic acid disodium into 15L of deionized water, stir to dissolve, then add 130 grams of 40nm silica nanoparticles to it, stir and turn on ultrasound to disperse Complete, finally add potassium hydroxide to adjust the pH to 10.5.

Embodiment 2

[0029] Weigh 80 grams of sodium pyrophosphate and 40 grams of ethylenediaminetetraacetic acid disodium into 13L of deionized water, stir to dissolve, then add 200 grams of 50nm silica nanoparticles to it, stir and turn on ultrasound to disperse Completely, finally add sodium hydroxide to adjust the pH to 9.5.

Embodiment 3

[0031] Weigh 100 grams of sodium silicate and 40 grams of diethanolamine into 15L of deionized water, stir to dissolve, then add 200 grams of 25nm silica nanoparticles to it, stir and turn on ultrasound to disperse completely, and finally add hydrogen Sodium oxide adjusts the pH to 11.0.

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PUM

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Abstract

The invention discloses a sapphire surface treatment technology, and particularly discloses a sapphire polishing solution and a preparation method thereof. The sapphire polishing solution comprises a deionized water solution, silicon dioxide nanoparticles, a dispersing agent, a complexing agent and a pH regulator, and is prepared by the steps of: firstly, adding the dispersing agent and the complexing agent into the deionized water; then, adding the silicon dioxide nanoparticles into the solution, continuously stirring, and simultaneously carrying out ultrasonic treatment for 5-8minutes until the dioxide nanoparticles are completely dispersed; and finally, adding the pH regulator into the mixed solution to adjust the pH value to be 9-11.5. According to the invention, the sapphire polishing solution is directly prepared by the silicon dioxide nanoparticles, so that the prepared polishing solution is low in solid content, effectively saves the preparation time and cost, has the characteristics of high polishing efficiency and long storage time, and is easy for subsequent cleaning technology; less additive which is mostly inorganic additive is used by the invention, so that the sapphire polishing solution is free from harm to the environment and the human body, and has good environmental protection property; and the preparation method is simple, effectivele, very low in requirements and easy to produce.

Description

technical field [0001] The invention relates to a sapphire surface treatment technology, in particular to a sapphire polishing liquid and a preparation method. Background technique [0002] The sapphire polishing liquid currently on the market mainly uses silica sol as the raw material for the preparation of the polishing liquid, which uses a large amount of organic additives. The high cost is a problem that cannot be ignored, and the concentration is also high, and the particles are easy to remain in the process of use. On the surface of sapphire, it will cause trouble to the subsequent process. Contents of the invention [0003] In order to solve the above-mentioned technical problems, the present invention provides a kind of sapphire polishing liquid directly prepared from the particles of silica nanoparticles, and a kind of sapphire polishing liquid with very low solid content of the prepared polishing liquid and its preparation method. [0004] A kind of sapphire pol...

Claims

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Application Information

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IPC IPC(8): C09G1/02
Inventor 李建明
Owner 长治虹源科技晶片技术有限公司
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