A kind of solar cell sheet and diffusion method thereof
A technology of a solar cell and a diffusion method, applied in the field of solar cells, can solve problems such as low conversion efficiency of solar cells, and achieve the effects of enhancing short-wave response and improving conversion efficiency
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Embodiment 1
[0050] Step S101, such as figure 2 As shown, a semiconductor substrate 201 is provided.
[0051] The semiconductor substrate 201 provides a working platform for the realization of the subsequent diffusion method, and the material of the semiconductor substrate shown can be a single crystal material or a polycrystalline material. The doping type of the semiconductor substrate can be N-type doping or P-type doping.
[0052] Step S102, such as image 3 As shown, under the first temperature condition, an impurity layer 202 is formed on the surface of the semiconductor substrate 201 to be diffused;
[0053] The impurity is introduced in the way of low-temperature source, that is, the temperature is low when the impurity is introduced. Due to the low activity of impurities under low temperature conditions, the impurities are evenly distributed on the surface of the semiconductor substrate, and most of the impurities are only deposited on the surface of the semiconductor substrat...
Embodiment 2
[0064] Corresponding to the diffusion method provided in Embodiment 1 of the present invention, Embodiment 2 of the present invention provides a solar battery sheet. Combine below Figure 6 The structure of the solar cell sheet will be described in detail.
[0065] The solar cell includes:
[0066] semiconductor substrate 601;
[0067] It should be noted that the semiconductor substrate material in this embodiment can be single crystal or polycrystalline; the doping type of the semiconductor substrate can be N-type doping or P-type doping. This is not limited.
[0068] a shallow junction 602 formed in the semiconductor substrate 601;
[0069] The doping type of the shallow junction 602 is opposite to that of the semiconductor substrate 601 , so as to form a PN junction in the semiconductor substrate 601 . Due to the adsorption of impurities by the oxide layer 603, the diffusion of impurities into the semiconductor substrate is hindered to a certain extent, so that the PN ...
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