Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Production method for a vinyl chloride-based resin having outstanding particle uniformity and heat stability

A technology of vinyl chloride resin and thermal stability, applied in the field of vinyl chloride resins, can solve the problem of no disclosure of particle size distribution effect and the like

Active Publication Date: 2013-04-10
LG CHEM LTD
View PDF6 Cites 8 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In this case, there is no disclosure about the effect of particle size distribution

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Production method for a vinyl chloride-based resin having outstanding particle uniformity and heat stability
  • Production method for a vinyl chloride-based resin having outstanding particle uniformity and heat stability
  • Production method for a vinyl chloride-based resin having outstanding particle uniformity and heat stability

Examples

Experimental program
Comparison scheme
Effect test

preparation example 1

[0051] Preparation Example 1 (Preparation Example 1 of Inorganic Compound Surface-treated with Organic Modifier)

[0052] Based on 100 parts by weight of the inorganic compound, glycerol monostearate is added in an amount of 10 parts by weight to the 4 al 2 (OH) 12 CO 3 ·3H 2 O or Mg 4 Zn 2 al 2 (OH) 12 CO 3 ·3H 2 O structure and 0.5 μm (micrometer) or 10 μm (micrometer) particle size hydrotalcite, followed by heating at 180° C., thereby preparing an inorganic compound surface-treated with an organic modifier.

preparation example 2

[0053] Preparation Example 2 (Preparation Example 2 of Inorganic Compound Surface-treated with Organic Modifier)

[0054] Except that stearic acid is used in an amount of 1 part by weight based on 100 parts by weight of the inorganic compound instead of glycerol monostearate, the same method as Preparation Example 1 was used to prepare 4 al 2 (OH) 12 CO 3 ·3H 2 O or Mg 4 Zn 2 al 2 (OH) 12 CO 3 ·3H 2 Inorganic compounds with O structure and 0.5 μm (micrometer) or 10 μm (micrometer) particle size surface-treated with organic modifiers.

Embodiment 1

[0055] Example 1 (Inorganic compound 1 undergoing bulk polymerization and surface treatment with organic modifier)

[0056] Except when the polymerization conversion rate is 10% or less than 10%, 0.01 parts by weight of the 0.5 μm (micrometer) particle size and Mg prepared in Preparation Example 1 are added. 4 Al 2 (OH) 12 CO 3 ·3H 2 Except for the hydrotalcite of the O structure surface-treated with an organic modifier, the same method as in Comparative Example 1 was repeated. Optical microscope images of the obtained seeds are shown in figure 1 Optical microscope images of neutralized final particles in c are shown in figure 1 d.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Granularityaaaaaaaaaa
Thicknessaaaaaaaaaa
Login to View More

Abstract

The present invention relates to a production method for a vinyl chloride-based resin having outstanding particle uniformity and heat stability, which is advantageous in that, by using an inorganic dispersion that has a specific structure while also being able to eliminate hydrogen chloride in a step in which a vinyl chloride resin is produced, a vinyl chloride resin will be produced that has outstanding particle uniformity and heat stability and also the thermal decomposition temperature of the resin is increased such that it is possible to even improve the product whiteness and physical properties during processing.

Description

technical field [0001] The present invention relates to a method for producing a vinyl chloride-based resin exhibiting excellent particle uniformity and thermal stability. More specifically, the present invention relates to a method for producing a vinyl chloride-based resin exhibiting excellent particle uniformity and thermal stability, wherein, by using a dispersion of an inorganic compound having a specific crystal structure, it is possible to produce a Homogeneity and thermal stability of vinyl chloride resin, hydrogen chloride can be removed from said inorganic compound dispersion during the preparation of the vinyl chloride resin, and the product can be improved during processing by increasing the thermal decomposition temperature of the resin whiteness and physical properties. Background technique [0002] In vinyl chloride resins, particle size and internal structure are important basic factors affecting the handling of the resin, the degree of mixing the resin with...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): C08F2/44C08F14/06C08K9/04C08L27/06
CPCC08F14/06C08F2/00C08F2/18
Inventor 金龙振金景铉
Owner LG CHEM LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com