a y 2 o 3 Improvement method of corrosion-resistant ceramic coating
A ceramic coating, corrosion-resistant technology, used in coatings, metal material coating processes, fusion spray plating, etc., can solve the problems of large damage to the cavity wall, loose organizational structure, and internal stress in the etching process, and achieve excellent results. Etching resistance, uniform color effect
Active Publication Date: 2017-09-12
SOI MICRO CO LTD
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Problems solved by technology
Entering 300mm equipment, as the plasma power increases, the plasma damages the etching process chamber wall more and more, making a series of problems prone to occur during the etching process: generation of particles; process chamber wall coating exfoliation, causing the plasma to interact directly with the aluminum substrate; Al 2 o 3 Component life limited by higher power
In addition, Y after atmospheric plasma spraying 2 o 3 The bonding force between the coating and the aluminum substrate is weak, the structure is relatively loose, and there is internal stress
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Abstract
The invention relates to the technical field of atmospheric plasma spraying, in particular to an improved method for a Y2O3 corrosion-resistant ceramic coating. The improved method includes the following steps: step (1), select Y2O3 powder with a purity greater than 99.95%; step (2), pretreat the surface of the substrate to be sprayed; step (3), select Ar and H2 gases as Ion gas, plasma spraying is carried out on the surface of the substrate by plasma spraying equipment to prepare a Y2O3 coating; step (4), performing low-temperature slow annealing treatment on the substrate sprayed with the Y2O3 coating. The Y2O3 coating prepared by the invention is pure white, uniform in color, no variegated spots, and has excellent etching resistance.
Description
An improved method of Y2O3 corrosion-resistant ceramic coating technical field The invention relates to the technical field of atmospheric plasma spraying, in particular to a Y 2 o 3 Improved methods for erosion-resistant ceramic coatings. Background technique At present, the low-temperature plasma microfabrication method has become a key technology for micro-nano processing of materials. It is the basis of preparation technologies such as microelectronics, optoelectronics, micromechanics, and micro-optics. Especially in the ultra-large-scale integrated circuit manufacturing process, there are Nearly one-third of the process is completed by means of plasma processing, such as plasma film deposition, plasma etching and plasma deglue. Among them, plasma etching is one of the most critical processes, and it is an irreplaceable process to realize the high-fidelity transfer of micro-patterns in VLSI production from photolithographic templates to silicon wafers. During the p...
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IPC IPC(8): C23C4/11C23C4/134C23C4/18
Inventor 邵花王文东夏洋李勇滔
Owner SOI MICRO CO LTD