Photosensitive resin composition, black array, color filter and liquid crystal display element thereof

一种感光性树脂、组成物的技术，应用在感光性树脂组成物领域，能够解决感光性低、表面阻抗稳定性不佳、黑色矩阵表面平坦性损失等问题，达到佳表面阻抗稳定性的效果

Active Publication Date: 2013-06-05
CHI MEI CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This patent solves the problem of low photosensitivity and poor developability of the photosensitive resin composition with high content of black pigment in the photolithography process by controlling the content of black pigment in the solid content of the photosensitive resin composition
[0006] However, since the industry has higher and higher requirements for the light-shielding properties of the black matrix, the solution is to increase the content of black pigments to improve the light-shielding properties of the black matrix, so the existing photosensitive resin composition can meet the needs of the industry , but the surface flatness of the black matrix formed by it will be lost, and the surface impedance stability is not good after heating

Method used

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  • Photosensitive resin composition, black array, color filter and liquid crystal display element thereof
  • Photosensitive resin composition, black array, color filter and liquid crystal display element thereof
  • Photosensitive resin composition, black array, color filter and liquid crystal display element thereof

Examples

Experimental program
Comparison scheme
Effect test

Synthetic example 1

[0148] With 100 parts by weight of fluorene epoxy compound (model ESF-300, manufactured by Nippon Steel Chemical; epoxy equivalent 231), 30 parts by weight of acrylic acid, 0.3 parts by weight of benzyltriethylammonium chloride, 0.1 parts by weight of 2,6-di-tert-butyl-p-cresol, and 130 parts by weight of propylene glycol monomethyl ether acetate are added to a 500mL four-necked flask in a continuous addition mode, and the feed rate is controlled at 25 parts by weight / minute, The temperature in the reaction process is maintained at 100° C. to 110° C., and after 15 hours of reaction, a light yellow transparent mixed liquid with a solid content concentration of 50 wt % can be obtained.

[0149] Then, 100 parts by weight of the above-mentioned light yellow transparent mixed solution was dissolved in 25 parts by weight of ethylene glycol monoethyl ether acetate, and 6 parts by weight of tetrahydrophthalic anhydride and 13 parts by weight of tetrahydrophthalic anhydride were added a...

Synthetic example 2

[0151] With 100 parts by weight of fluorene epoxy compound (model ESF-300, manufactured by Nippon Steel Chemical; epoxy equivalent 231), 30 parts by weight of acrylic acid, 0.3 parts by weight of benzyltriethylammonium chloride, 0.1 parts by weight of 2,6-di-tert-butyl-p-cresol, and 130 parts by weight of propylene glycol monomethyl ether acetate are added in a 500mL four-necked flask in a continuous addition mode, and the feed rate is controlled at 25 parts by weight / minute, The temperature in the reaction process is maintained at 100° C. to 110° C., and after 15 hours of reaction, a light yellow transparent mixed liquid with a solid content concentration of 50 wt % can be obtained.

[0152] Next, 100 parts by weight of the light yellow transparent mixed solution obtained above was dissolved in 25 parts by weight of ethylene glycol monoethyl ether acetate, and 13 parts by weight of benzophenone tetracarboxylic dianhydride was added, and the mixture was heated at 90° C. React ...

Synthetic example 3

[0154] 400 parts by weight of epoxy compound [model NC-3000, produced by Nippon Kayaku (Co., Ltd.); epoxy equivalent 288], 102 parts by weight of acrylic acid, 0.3 parts by weight of p-methoxyphenol (p-methoxyphenol), 5 parts by weight The triphenylphosphine of weight part, and the propylene glycol monomethyl ether acetate of 264 weight parts are placed in reaction bottle, and the temperature of this reaction process is maintained on 95 ℃, reacts 9 hours, can obtain an acid value and be 2.2mgKOH / intermediate product of g. Next, 151 parts by weight of tetrahydrophthalic anhydride (tetrahydrophthalic anhydride) was added and reacted at 95°C for 4 hours to obtain an unsaturated compound with an acid value of 102 mgKOH / g and a weight average molecular weight of 3,200. Resin (hereinafter abbreviated as A-1-3).

[0155] [Preparation of other alkali-soluble resins (A-2)]

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Abstract

The invention relates to a photosensitive resin composition, a black array, a color filter and a liquid crystal display element thereof. The photosensitive resin composition includes (A) an alkali-soluble resin, (B) a polysiloxane, (C) an ethylenically unsaturated compound, (D) a photo-initiator, (E) a black pigment, and (F) a solvent. The alkali-soluble resin includes an unsaturated-group-containing resin obtained by subjecting a mixture containing (i) an epoxy compound having at least two epoxy groups and (ii) a compound having at least one carboxyl group and at least one ethylenically unsaturated group to polymerization. A weight ratio of the unsaturated-group-containing resin to the polysiloxane ranges from 0.1 to 3.0. Application of the photosensitive resin composition is also disclosed.

Description

technical field [0001] The invention relates to a photosensitive resin composition for a color filter, in particular to a photosensitive resin composition for a black matrix in a color filter. The invention also provides a black matrix, a color filter and a liquid crystal display element formed from the photosensitive resin composition. Background technique [0002] In order to improve the contrast and display quality of the current liquid crystal display, it is generally used to place a black matrix in the stripe (stripe) and dot (dot) gap of the color filter, and the function of the black matrix can prevent light leakage between pixels, The resulting loss of contrast and color purity. However, in the past, the materials used in the black matrix are mainly vapor-deposited films containing chromium or chromium oxide. However, when the above-mentioned vapor-deposited films are used as the material of the black matrix, there are disadvantages such as complicated manufacturing...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/004G03F7/027G02B5/20G02F1/1335
CPCG03F7/0757G03F7/0007G02B5/22G03F7/027G02B5/201
Inventor 廖豪伟曾靖渊李俊贤吴明儒施俊安
Owner CHI MEI CORP
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