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Light spectrum purification filter device for laser plasma extreme ultraviolet lithography source

A laser plasma and extreme ultraviolet lithography technology, applied in the field of extreme ultraviolet lithography, can solve problems such as insignificant effects, and achieve the effects of low cost, easy fabrication, and improved system stability

Inactive Publication Date: 2015-06-17
SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The current technology 1 has a high reflectivity for the infrared spectrum, and the effect is not obvious for the deep ultraviolet-visible light band in the out-of-band band. It must be combined with other spectral purification filtering technologies to obtain a relatively pure 13.5nm±1% spectrum

Method used

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  • Light spectrum purification filter device for laser plasma extreme ultraviolet lithography source
  • Light spectrum purification filter device for laser plasma extreme ultraviolet lithography source
  • Light spectrum purification filter device for laser plasma extreme ultraviolet lithography source

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Embodiment Construction

[0018] Below, the present invention will be further described in conjunction with the accompanying drawings, but the protection scope of the present invention should not be limited thereby.

[0019] see first image 3 , figure 1 It is a relative position relationship diagram of the first grating 11, the thin metal sheet 12 and the second grating 13 of a spectrum purification filter device used for laser plasma extreme ultraviolet lithography light source of the present invention, by figure 1 It can be seen that the composition of the spectrum purification filtering device of the present invention includes in turn the first grating 11 of the surface coating, the thin metal sheet 12 with high transmittance for the 13.5nm spectrum and the second grating 13 of the surface coating, the first grating 11 The line direction of the second grating 13 is perpendicular to each other, the grating constant is 10-150 nm, the duty cycle is 40%-60%, and the thickness is 1-10 mm.

[0020] The...

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Abstract

The invention discloses a light spectrum purification filter device for a laser plasma extreme ultraviolet lithography source. The device is characterized by sequentially comprising a first optical grating coated with film on a surface, a thin metal sheet with high transmittance for a light spectrum with 13.5nm, and a second light grating coated with film on the surface, wherein surfaces of the first light grating, the second light grating and the thin metal sheet are mutually parallel, line directions of the first light grating and the second light grating are mutually vertical, a light grating constant is 10-150nm, a duty ratio is 40-60 percent, and the thickness is 1-10mm. The thin metal sheet is made from zirconium or molybdenum, and the thickness is 0.1-5mm. The device has a simple structure, and the light spectrum of laser plasma radiation is enabled to be purified.

Description

technical field [0001] The invention relates to extreme ultraviolet lithography, in particular to a spectral purification filter device for laser plasma extreme ultraviolet lithography light source. Background technique [0002] The extreme ultraviolet (EUV) light source with a wavelength of 13.5nm±1% is generally considered to be the next-generation lithography light source after 193nm, and the laser plasma extreme ultraviolet light source (LPP) is especially concerned by scientists from all over the world. LPP generates plasma electromagnetic radiation by focusing a high-power, high-repetition-frequency laser beam on a tin or zinc target pellet in a droplet state, and then collects and focuses the desired wavelength spectrum on the intermediate focus through the collector and spectral purification filter unit . Because the plasma not only radiates the in-band spectrum of 13.5nm±1%, but also includes the out-of-band spectrum in addition to the in-band spectrum. Spectral p...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B5/20G02B5/18G03F7/20
Inventor 张运波曾爱军黄惠杰
Owner SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI