Composite semi-conductor integrated circuit with three-dimensional element
A technology of three-dimensional components and integrated circuits, which is applied to semiconductor devices, semiconductor/solid-state device components, circuits, etc., and can solve problems such as component damage and component performance reduction.
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[0026] figure 1 It is a schematic cross-sectional structure diagram of the composite semiconductor integrated circuit of the present invention, which includes at least one electronic component 11, a bonding pad 12 located above the electronic component 11, and a first dielectric layer 13 interposed between the two as electrical isolation. The electronic component 11 is formed on a composite semiconductor substrate, and a semi-insulating gallium arsenide substrate is preferred. The electronic component 11 can be a high electron mobility transistor (HEMT), a heterojunction bipolar transistor (HBT), a thin film resistor (TFR), a diode, a metal-insulating layer-metal capacitor (MIM) Or a stack of metal-insulating layer-metal capacitors.
[0027] The thickness of the first dielectric layer 13 between the electronic component 11 and the bonding pad 12 is between 10 and 30 microns. The thickness in this range is sufficient to effectively reduce the coupling capacitance between the ele...
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