Method for preparing film system with secondary electron emission function

A secondary electron emission and functional technology, applied in sputtering plating, ion implantation plating, vacuum evaporation plating, etc., can solve the problems of short life of electron multipliers, short service life, and failure to solve the life of cesium atomic clocks, etc. Achieve the effects of good compactness, high secondary electron emission rate and strong adhesion

Active Publication Date: 2013-07-24
LANZHOU INST OF PHYSICS CHINESE ACADEMY OF SPACE TECH
View PDF2 Cites 15 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] One of the important reasons is that problems such as the short life of cesium atomic clocks have not been solved.
There are many factors that affect the working life of the cesium atomic clock, among which the short life of the electron multiplier is one of the main reasons. There is a problem with gain and high stability coordination

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for preparing film system with secondary electron emission function

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0025] A method for preparing a film system with a secondary electron emission function, the steps of the method are as follows:

[0026] (1) Clean the vacuum chamber: open the vacuum chamber, place the aluminum film that protects the target from pollution directly above the target, remove the film layer that falls off in the vacuum chamber and the pollutants in the air, and then use degreasing gauze dipped in absolute ethanol Wipe clean the inner wall of the vacuum chamber; there are three kinds of target materials, namely metal titanium target, metal silver target, and ceramic magnesium oxide target; the purity of the target material is above 99.99%;

[0027] (2) Clean the substrate: put the No. 304 stainless steel substrate into a clean container, rinse it with deionized water, and then ultrasonically clean the No. 304 stainless steel substrate with analytical pure acetone and analytical pure alcohol for 15 minutes, and then use analytical Rinse with pure anhydrous ethanol,...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a method for preparing a film system with a secondary electron emission function, belonging to the field of functional film preparation. The method comprises the following steps of: (1) cleaning a vacuum chamber; (2) cleaning a substrate; (3) loading the substrate; (4) vacuumizing the vacuum chamber; (5) cleaning a target material by using plasma; and (6) depositing secondary electron emission films. According to the method, the traditional oxidation process is replaced with a preparation method that multiple layers of composite functional films are deposited, so that the prepared film has the advantages of good compactness, strong adhesion, high secondary electron emission rate and the like.

Description

technical field [0001] The invention relates to a preparation method of a film system with a secondary electron emission function, in particular to a preparation method for depositing a secondary electron emission film by using a magnetron sputtering technique on a stainless steel substrate, and belongs to the field of preparation of functional films. Background technique [0002] Atomic clocks are the core equipment for timekeeping and time service in various countries. They are widely used in military navigation and positioning systems, time-frequency measurement stations and time-frequency websites, and satellite civil navigation. They are one of the core loads of satellite navigation global positioning systems. At present, the relatively mature atomic clocks mainly include rubidium clocks, hydrogen clocks and cesium clocks. In comparison, cesium clocks have higher precision, the best long-term stability, and high reliability. There are very clear background requirements ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/06C23C14/35
Inventor 王多书李晨张玲熊玉卿王济洲董茂进吴伟王超高欢
Owner LANZHOU INST OF PHYSICS CHINESE ACADEMY OF SPACE TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap