A kind of preparation method of high damage threshold fundamental frequency light absorption material

A technology with high damage threshold and absorbing materials, applied in glass manufacturing equipment, manufacturing tools, glass molding, etc., can solve the problems of low frequency tripled laser damage threshold and inability to separate, achieve high laser damage threshold, improve transmission efficiency, and the effect of increasing the load capacity

Inactive Publication Date: 2015-12-02
XI'AN INST OF OPTICS & FINE MECHANICS - CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] Aiming at the problem that the current triple frequency laser damage threshold of existing optical materials is low, and it cannot be used as a spectroscopic element (such as a grating, a prism) to separate the fundamental frequency light mixed in the triple frequency high-energy laser, the present invention proposes a high damage threshold , Preparation method of fundamental frequency light absorbing material capable of absorbing fundamental frequency light and highly transparent triple frequency light

Method used

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  • A kind of preparation method of high damage threshold fundamental frequency light absorption material
  • A kind of preparation method of high damage threshold fundamental frequency light absorption material
  • A kind of preparation method of high damage threshold fundamental frequency light absorption material

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Effect test

Embodiment 1

[0035] According to the above 1 # Calculate the weight percentage of the glass from the molar composition in the glass, and then weigh the raw materials and mix them evenly. Put the prepared powder into a silicon carbide rod electric furnace for melting, and continuously feed nitrogen gas during the melting process to protect the molten glass. The melting temperature is controlled at 1050-1150 ° C, and the melting is determined according to the amount of raw materials Depending on the length of time, the molten glass is stirred during the melting process. After the molten glass is clarified, inject the molten glass into the preheated mold, and quickly put the glass into the muffle furnace that has been heated up. First, keep it warm at the transition temperature Tg of the glass for 2 hours, and then heat it at 10°C / hour. Anneal at a speed of 50°C, close the muffle furnace, cool down to room temperature, and finally take out the finished product.

[0036] The sample is proces...

Embodiment 2

[0038] According to the above 2 # Calculate the weight percentage of the glass from the molar composition in the glass, and then weigh the raw materials and mix them evenly. Put the prepared powder into a silicon carbon rod electric furnace for melting, and continuously feed nitrogen gas during the melting process to protect the molten glass. The melting temperature is controlled at 1050-1150°C, and the melting is determined according to the amount of raw materials. Depending on the length of time, the molten glass is stirred during the melting process. After the molten glass is clarified, inject the molten glass into the preheated mold, and quickly put the glass into the muffle furnace that has been heated up. First, keep it warm at the transition temperature Tg of the glass for 2 hours, and then heat it at 10°C / hour. Anneal at a speed of 50°C, close the muffle furnace, cool down to room temperature, and finally take out the finished product.

[0039] The sample is processe...

Embodiment 3

[0041] According to the above 3 # Calculate the weight percentage of the glass from the molar composition in the glass, and then weigh the raw materials and mix them evenly. Put the prepared powder into a silicon carbon rod electric furnace for melting, and continuously feed nitrogen gas during the melting process to protect the molten glass. The melting temperature is controlled at 1050-1150°C, and the melting is determined according to the amount of raw materials. Depending on the length of time, the molten glass is stirred during the melting process. After the molten glass is clarified, inject the molten glass into the preheated mold, and quickly put the glass into the muffle furnace that has been heated up. First, keep it warm at the transition temperature Tg of the glass for 2 hours, and then heat it at 10°C / hour. Anneal at a speed of 50°C, close the muffle furnace, cool down to room temperature, and finally take out the finished product.

[0042] The sample is processe...

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Abstract

The invention provides a preparation method of a fundamental frequency light absorbing material with high damage threshold. The method comprises the following steps: 1) preparing raw materials and molar ratio; 2) adding uniformly mixed raw powder to a crucible and fusing; 3) after cooling molten glass, injecting the glass to a mould to form; and 4) annealing the glass to obtain the fundamental frequency light absorbing glass with high damage threshold. According to the material prepared by the invention, the damage problem that rasters, spectroscopic films and beam splitter prisms split light under intense laser, so that the loading capacity of a laser is improved. The material is highly transparent in near ultraviolet band and has good glass forming property, and meanwhile further has high laser-damaged threshold, so that the material can be used as the fundamental frequency light absorbing material used in the field of intense laser.

Description

technical field [0001] The invention belongs to the field of optical materials, and relates to oxyfluorine glass, in particular to a preparation method of a high damage threshold absorption material. Background technique [0002] The development of high-energy lasers puts forward high requirements on optical materials, such as using lasers as the driver of ICF (Inertial Confinement Fusion), the energy density of the laser needs to reach 8J / cm 2 (351nm, 3ns), a good optical element is the decisive factor for building a giant laser device, and it is also the biggest challenge facing the project. In the previous application, quartz gratings and prisms were used as light-splitting elements to separate the doubled frequency, doubled frequency, and tripled frequency from the frequency-doubled crystal to obtain tripled frequency laser output to achieve laser ignition tasks. However, the reality is that fused silica gratings and prisms cannot withstand such high laser energy, and r...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C03C6/06C03B19/02
CPCY02P40/57
Inventor 侯超奇彭波陆敏王鹏飞高飞李玮楠
Owner XI'AN INST OF OPTICS & FINE MECHANICS - CHINESE ACAD OF SCI
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