Preparation method of polycrystalline silicon
A polysilicon and fluorosilicate technology, applied in chemical instruments and methods, silicon compounds, inorganic chemistry, etc., can solve the problems of three wastes, less environmental pollution, and high temperature, and achieve optimized process conditions, mild reaction conditions, and lower temperature. Effect
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[0020] A method for preparing polysilicon, comprising the following steps: placing reaction raw materials in a reaction container, the reaction raw materials include fluorosilicate and a metal as a reducing agent; inserting electrodes into the reaction container, the electrodes include positive electrodes and negative electrodes, between the positive electrode and the Applying a voltage between the negative electrodes; heating and stirring the reaction raw materials under a protective gas atmosphere; continuing to heat the reaction raw materials to the first temperature, keeping the temperature for a predetermined time, and cooling to obtain the reduced product; washing the reduced product with pure water, acid and drying in sequence, Get polysilicon.
[0021] As one of the raw materials for the reaction, fluorosilicate needs to be dried before being placed in the reaction vessel, mainly to remove the water that may exist in the fluorosilicate. When the fluorosilicate contains ...
Embodiment 1
[0038] Weigh the reaction raw materials sodium fluorosilicate and metal sodium according to the weight ratio of 3:1, put the reaction raw materials into a clean three-necked glass bottle, and inject N 2 Remove the air in the bottle, add an electrode and a stirring head into the bottle, the electrode includes a positive electrode and a negative electrode. Start stirring, then continue to heat the reaction raw materials to the first temperature of 160° C., keep the temperature for 2 hours, stop stirring, and cool to room temperature. Transfer the obtained reduction product into a clean beaker filled with pure water, wash and vacuum filter, wash the product after suction filtration with pure water for 3 times, then further wash with electronically pure hydrochloric acid and vacuum filter, and finally heat it at 60°C Dry under vacuum for 12 hours.
[0039] figure 1 It is the X-ray diffraction pattern of the polycrystalline silicon that embodiment 1 makes. The final analysis by ...
Embodiment 2
[0041] In Example 2, the electrode additional voltage is 3.4V, and the corresponding first temperature is 170° C., and the rest of the preparation method is the same as that of Example 1.
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