Preparation method for polyurethane polishing material by using network interpenetration

A technology of polishing materials and network interpenetration, which is applied in the direction of polishing compositions containing abrasives, etc., can solve the problems of poor mold fit between polishing pads and workpieces, hard polyurethane matrix materials, lack of toughness and elasticity, etc., and achieve porosity Effects of increase, long storage time at room temperature, and weight reduction

Inactive Publication Date: 2013-10-09
HEFEI HONGGUANG ABRASIVE SCI & TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In the formulation production, the polyurethane base material synthesized by only using a single polyether polyol and toluene diisocyanate is often hard and brittle, lacking the proper toughness and elasticity
During the polishing process, the mold fit between the polishing pad and the workpiece is poor, and it is prone to "passivation" resulting in a decrease in the cutting rate

Method used

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  • Preparation method for polyurethane polishing material by using network interpenetration

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Experimental program
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Embodiment 1

[0016] This embodiment provides a method for making polyurethane polishing material by network interpenetrating method, comprising the following steps:

[0017] a. Mix a total of 35kg of polymer polyol, epoxy resin, and polyether polyol mixture in a weight ratio of 5:2:3, and heat to 60-75°C. The weight ratio of polyether 210 and polyether 330 2:3, the molecular weight of the polymer polyol and the epoxy resin is 3000-4500, and the molecular weight of the polyether polyol is 100-300;

[0018] b. Add 26kg of toluene diisocyanate and 0.5kg of composite catalyst, and stir rapidly for 6-8 minutes to make the viscosity of the mixture reach 1600-1800cp.s / 25°C, then add 14kg of ethylene glycol by weight for chain extension ;

[0019] c. Stir for 2-3 minutes, the reaction viscosity reaches 2600-3000cp.s / 25°C, the reaction temperature is 110-115°C, add 0.5kg of water, 20kg of cerium oxide, zirconia mixture polishing powder, cerium oxide, zirconia The weight ratio is 3:1, high-speed s...

Embodiment 2

[0021] Same conditions as in Example 1, step b was stirred rapidly for 10-12 minutes.

Embodiment 3

[0023] a. Mix a total of 40kg of polymer polyol, epoxy resin, and polyether polyol mixture in a weight ratio of 5:2:3, and heat it to 55-60°C. The weight ratio of polyether 210 and polyether 330 is The ratio is 2:3, the molecular weight of the polymer polyol is 3000-4500 and the epoxy resin is 300-800, and the molecular weight of the polyether polyol is 100-300;

[0024] b. Add 24kg of toluene diisocyanate and 0.6kg of composite catalyst, stir rapidly for 10-12 minutes to make the viscosity of the mixture reach 1600-1800cp.s / 25°C, then add 16kg of ethylene glycol by weight for chain extension ;

[0025] c. Stir for 2-3 minutes, the reaction viscosity reaches 2600-3000cp.s / 25°C, the reaction temperature is 110-115°C, add 0.5kg of water, 24kg of polishing powder of a mixture of cerium oxide and zirconia, cerium oxide, zirconia The weight ratio is 3:1, high-speed stirring at 100-115°C for 10-15s, injection molding, curing at 120°C for 16 hours, demoulding, and slicing.

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Abstract

The invention discloses a preparation method for a polyurethane polishing material by using network interpenetration. A secondary hydroxyl group and an epoxy group in polymer polyol and an epoxy resin are allowed to react with isocyanate by using an interpenetrating polymer network (IPN) method, then polishing powder is interpenetrated and filled into a polyurethane network, so pressure resistance, heat resistance and hydrolytic stability of the polyurethane polishing material can be improved, and wear resistance of a substrate material is appropriately reduced at the same time; meanwhile, since a part of organic dispersions are filled in the structure of the material, wear resistance of a polyurethane foam substrate is reduced, which enables the substrate and a polishing powder filling material to fall off synchronously, so the problems of great possibility of passivation and reduction of a stock removal rate of a polishing gasket with high wear resistance are solved.

Description

technical field [0001] The invention relates to a method for making polyurethane polishing material by network interpenetration method. Background technique [0002] The traditional polyurethane polishing sheet is made by adding cerium oxide polishing powder to the polyurethane (polyurethane, polyurethane) microporous foam system, foaming and curing to make a thermosetting material with a microporous structure, and cutting it into sheets Afterwards, it is used for optical glass polishing. In the formulation production, the polyurethane base material synthesized by only using a single polyether polyol and toluene diisocyanate is often hard and brittle, lacking due toughness and elasticity. During the polishing process, the mold fit between the polishing pad and the workpiece is poor, and it is prone to "passivation" resulting in a decrease in the cutting rate. Contents of the invention [0003] The present invention proposes a method for making polyurethane polishing mate...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C08G18/76C08G18/65C08G18/58C08G18/32C08J9/08C09G1/02
Inventor 孔维洪
Owner HEFEI HONGGUANG ABRASIVE SCI & TECH
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