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Preparation method of vanadium trioxide or doped vanadium trioxide nano powder

A vanadium trioxide nanometer and vanadium trioxide technology are applied in the field of nano-powder preparation, which can solve the problems of inability to obtain vanadium trioxide nano-powder and vanadium trioxide nano-powder, and achieve large-scale and rapid preparation. , Narrow size distribution, scientific effect of preparation method

Inactive Publication Date: 2015-01-14
HEFEI INSTITUTES OF PHYSICAL SCIENCE - CHINESE ACAD OF SCI +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, although this preparation method can obtain nanometer metal particles, it cannot obtain vanadium trioxide nanopowders or doped vanadium trioxide nanopowders.

Method used

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  • Preparation method of vanadium trioxide or doped vanadium trioxide nano powder
  • Preparation method of vanadium trioxide or doped vanadium trioxide nano powder
  • Preparation method of vanadium trioxide or doped vanadium trioxide nano powder

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0020] The concrete steps of preparation are:

[0021] Step 1, put vanadium pentoxide powder or vanadium pentoxide mixed powder doped with oxides in a powder feeder and keep it in a stirring state; wherein, the vanadium pentoxide mixed powder doped with oxides The weight ratio of vanadium pentoxide and doping oxide in the body is 100:0.5, and the doping oxide is aluminum oxide.

[0022] Step 2, send the vanadium pentoxide powder in the powder feeder or the vanadium pentoxide mixed powder doped with oxides into the plasma arc under the reducing reaction atmosphere at a rate of 10g / min by nitrogen gas. The temperature is 2000 The reduction reaction is carried out in the plasma chamber at ℃; wherein, before the plasma arc is ignited, the plasma chamber is pre-deoxygenated with hydrogen gas, the arc-starting hydrogen flow rate is 5L / min when the plasma arc is ignited, and the reduction reaction atmosphere has a volume ratio of 1:10 mixed gas of hydrogen and water vapor, the flow ...

Embodiment 2

[0025] The concrete steps of preparation are:

[0026] Step 1, put vanadium pentoxide powder or vanadium pentoxide mixed powder doped with oxides in a powder feeder and keep it in a stirring state; wherein, the vanadium pentoxide mixed powder doped with oxides The weight ratio of vanadium pentoxide to doping oxide in the body is 100:1.2, and the doping oxide is aluminum oxide.

[0027] Step 2, the vanadium pentoxide powder in the powder feeder or the vanadium pentoxide mixed powder doped with oxides is sent into the plasma arc under the reducing reaction atmosphere at a rate of 35g / min by nitrogen gas. The temperature is 2150 The reduction reaction is carried out in the plasma chamber of ℃; wherein, before the plasma arc is ignited, the plasma chamber is pre-deoxygenated with hydrogen gas, the flow rate of the arc-starting hydrogen gas when the plasma arc is ignited is 12L / min, and the reduction reaction atmosphere has a volume ratio of 1:13 mixed gas of hydrogen and water va...

Embodiment 3

[0030] The concrete steps of preparation are:

[0031] Step 1, put vanadium pentoxide powder or vanadium pentoxide mixed powder doped with oxides in a powder feeder and keep it in a stirring state; wherein, the vanadium pentoxide mixed powder doped with oxides The weight ratio of vanadium pentoxide and doping oxide in the body is 100:1.8, and the doping oxide is aluminum oxide.

[0032] Step 2, the vanadium pentoxide powder in the powder feeder or the vanadium pentoxide mixed powder doped with oxides is sent into the plasma arc under the reducing reaction atmosphere at a rate of 65g / min by nitrogen gas. The temperature is 2300 The reduction reaction is carried out in the plasma chamber at ℃; wherein, before the plasma arc is ignited, the plasma chamber is pre-deoxygenated with hydrogen gas, the flow rate of the arc-starting hydrogen gas when the plasma arc is ignited is 18L / min, and the reduction reaction atmosphere has a volume ratio of 1:15 mixed gas of hydrogen and water v...

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Abstract

The invention discloses a preparation method of vanadium trioxide or doped vanadium trioxide nano powder. The preparation method comprises the following steps of: firstly, feeding vanadium trioxide powder or vanadium trioxide mixed powder doped with an oxide into a powder conveyer in a stirring state; secondly, feeding the vanadium trioxide powder or the vanadium trioxide mixed powder doped with the oxide into a plasma chamber in which the temperature of plasma arc is 2,000-2,500 DEG C in a reduction reaction atmosphere, by virtue of nitrogen at a velocity of 10-120g / min, and carrying out reduction reaction, wherein the reduction reaction atmosphere is a mixture gas of hydrogen and steam in a volume ratio of 1:(10-20), and the flow is 15-75L / min; subsequently, collecting a reduction reaction product from the plasma chamber by using a nano powder capturer, thus preparing the vanadium trioxide or the doped vanadium trioxide nano powder with a particle size of 20-100nm. The process is simple, raw materials are easily available, waste discharge is prevented, and the vanadium trioxide or the doped vanadium trioxide nano powder of high purity can be rapidly prepared in large scale with low cost.

Description

technical field [0001] The present invention relates to a kind of preparation method of nanopowder, especially a kind of vanadium trioxide (V 2 o 3 ) or a preparation method of doped vanadium trioxide nanopowder. Background technique [0002] Nanomaterials have attracted more and more attention due to their large specific surface area and excellent properties in many aspects compared with bulk materials. Recently, people have made unremitting efforts in order to obtain nano-metal materials, such as a kind of "method for preparing nano-metal by low-temperature plasma reduction" disclosed in CN 101032754 A published on September 12, 2007. ". The method mentioned in this manual is to directly put the metal salt into the vacuum chamber of the plasma discharger, and after the vacuum chamber is evacuated, the plasma discharge gas with a pressure of 30-200Pa is introduced, and the high-voltage power supply is used to connect the two ends of the electrode. Apply 200-5000V DC or ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C01G31/02B82Y40/00
Inventor 李广海孔凤玉李明李登兵杨磊张芬红
Owner HEFEI INSTITUTES OF PHYSICAL SCIENCE - CHINESE ACAD OF SCI
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