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Transparent oxide film and process for producing same

A technology of transparent oxide and manufacturing method, which is applied in the direction of final product manufacturing, sustainable manufacturing/processing, vacuum evaporation coating, etc., can solve the problems of function decline, lower refractive index, poor crystal phase, etc., and achieve high transparency, Effect of low refractive index and high gas barrier properties

Active Publication Date: 2013-10-30
MITSUBISHI MATERIALS CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

That is, in the target described in the technology of the above-mentioned Patent Document 1, since many lumps are generated during sputtering, it takes time to clean the device, etc., so it is required to use a target other than the tin oxide-based composition system that is excellent in gas barrier properties. transparent oxide film
However, the transparent oxide film produced by the technology of the above-mentioned patent document 2 is a film for optical discs, so the refractive index is relatively high. Reduce the refractive index so that it is close to the refractive index of the resin film substrate (for example, when the wavelength is 633nm, the refractive index n: 1.5~1.7)
Therefore, it is considered that by adding more SiO to the zinc oxide-based transparent oxide film, 2 method to reduce the refractive index, but as described in Patent Document 2, if SiO 2 If it exceeds 20wt%, there will be an added component that causes precipitation, that is, SiO 2 The unfavorable situation of the crystalline phase
Once the crystalline phase is precipitated, the function as a gas barrier (such as water vapor barrier) will be reduced, so it cannot be used as a protective film

Method used

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  • Transparent oxide film and process for producing same
  • Transparent oxide film and process for producing same

Examples

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Effect test

Embodiment

[0044] Below, refer to Figure 2 to Figure 8 The evaluation results of Examples of the transparent oxide film produced based on the above-mentioned present embodiment will be described.

[0045] Production of Examples of the present invention was carried out under the following conditions. First to Al 2 o 3 Powder, SiO 2 Powder and ZnO powder were weighed to achieve the composition ratio shown in Table 1, and the obtained powder and zirconia balls (a ball with a diameter of 5 mm and a ball with a diameter of 10 mm balls) were placed in a 10 L plastic container (polyethylene pot), and wet-mixed with a ball mill for 48 hours to obtain a mixed powder. In addition, alcohol is used as a solvent, for example.

[0046] Next, after drying the obtained mixed powder, it is granulated, for example, with a sieve with a mesh size of 250 μm, and after further vacuum drying, it is dried at 1200° C. 2 The pressure was hot-pressed in vacuum for 5 hours as a sintered body. The hot-presse...

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Abstract

Provided are: a zinc oxide-based transparent oxide film which has a low refractive index and good gas barrier properties; and a process for producing the same. This transparent oxide film is amorphous, and has a composition which contains, relative to the total amount of all the metal components, 0.9 to 20.0at% of Al and 25.5 to 68.0at% of Si with the balance consisting of Zn and unavoidable impurities. In this process, DC sputtering is conducted in an inert gas atmosphere that contains oxygen and / or under such conditions that the substrate is in a heated state, using a sputtering target consisting of a sintered oxide which has a composition that contains, relative to the total amount of all the metal components, 0.3 to 4.0wt% of Al and 6.0 to 14.5wt% of Si with the balance consisting of Zn and unavoidable impurities and in which both a composite oxide, Zn2SiO4, and ZnO are present in the structure.

Description

technical field [0001] The present invention relates to a zinc oxide-based transparent oxide film excellent in gas barrier properties and a method for producing the same. The transparent oxide film is used as an organic light-emitting display element, a liquid crystal display element, an electroluminescent display element, and a manufacturing method thereof. Electrophoretic display elements, toner display elements and other electronic papers or thin-film solar cells, etc. Gas barrier layer or inorganic film of thin film sealing layer, and gas barrier layer on the transparent electrode layer of thin film solar cells based on compound semiconductors. Background technique [0002] Conventionally, a technique of producing a transparent oxide film by a sputtering method as a gas barrier layer for use in electronic paper such as a liquid crystal display element, an electroluminescent display element, an electrophoretic display element, or a toner display element is known. Gas barr...

Claims

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Application Information

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IPC IPC(8): C23C14/34C04B35/16C04B35/453H01L31/04
CPCC04B2235/3418C04B35/18C04B2235/3284C04B35/453C04B35/16H01L31/022483C23C14/08C04B2235/3217C23C14/3414H01L31/048Y02E10/541C04B2235/77H01L31/0322C04B35/645H01L31/03923H01L31/03925H01L31/1884Y02P70/50C04B35/64H01L31/022466
Inventor 山口刚张守斌近藤佑一
Owner MITSUBISHI MATERIALS CORP
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