Sputtering ion gun

An ion gun and ion technology, applied in the field of sputtering ion guns, can solve the problems of direction deviation, low ion movement speed, low ionization efficiency, etc., and achieve the effects of simple structure, improved surface treatment effect, and convenient use.
CN103474318AInactive Publication Date: 2013-12-25DALIAN JIAOTONG UNIVERSITY
5 Cites 7 Cited by

Patent Information

Authority / Receiving Office
CN Β· China
Patent Type
Applications(China)
Current Assignee / Owner
DALIAN JIAOTONG UNIVERSITY
Publication Date
2013-12-25
Estimated Expiration
Not applicable Β· inactive patent

Smart Images

  • Figure 1
    Figure 1
  • Figure 2
    Figure 2
  • Figure 3
    Figure 3
Patent Text Reader

Abstract

The invention discloses a sputtering ion gun which is provided with an airflow direction regulating device, an argon ion generating device and a focusing lens, wherein the argon ion generating device is internally provided with an on-load voltage adjustable electronic accelerating grid mesh and a lamp filament correlated with a reference point position of the electronic accelerating grid mesh; one side wall of the electronic accelerating grid mesh is provided with a circular tube of a metal mesh; the electronic accelerating grid mesh is provided with a grid mesh anode at the front end and a grid mesh cathode at the rear end; the motion speeds of argon ions along the axial direction of the grid mesh are controlled through regulating a voltage loaded on the electronic accelerating grid mesh, thus the ion generating efficiency is regulated. The sputtering ion gun can be used alone during surface etching or deep analysis, and can be used for obtaining an improved surface treatment effect and ensuring that a surface treatment process is controllable. The ion sputtering and vacuum annealing can be adopted for performing repeated circular treatment during sample surface cleaning treatment or surface reconstruction. The material of the whole set of ion gun completely meets the requirement for use in an ultrahigh-vacuum environment, and can resist to baking at high temperature of over 200 DEG C.
Need to check novelty before this filing date? Find Prior Art

Description

technical field

[0001] The invention relates to a sputtering ion gun, which relates to the electronic optics or ion optics device of the patent classification number H01 basic electrical component H01J discharge tube or discharge lamp H01J3 / 00 commonly used in two or more basic types of discharge tubes or lamps Parts or parts of the ion trap H01J3 / 04 ion gun. Background technique

[0002] In current scientific research and engineering applications, surface science is playing an important role, and it is a basic link in the synthesis of new materials and the analysis of physical and chemical properties of materials, especially in the preparation of nanoscale materials and nanomanufacturing. . Obtaining and controlling surface structure is the basis of surface science and the premise of nanotechnology. Typical surface treatment methods include dissociation, annealing and ion sputtering, and annealing and ion sputtering are almost the standard configurations of surface analys...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More