Liquid photosensitive corrosion-resistant printing ink and preparation method thereof

Abstract

The invention discloses a liquid photosensitive corrosion-resistant printing ink which is characterized by being prepared from the following raw materials in parts by weight: 1-3 parts of an organic pigment, 10-12 parts of petroleum resin C5, 5-8 parts of allyl glycidyl ether, 1-2 parts of aluminium sulphate, 2-3 parts of 2-ethylhexyl dihydrogen phosphate, 10-12 parts of ethyl acrylate, 14-17 parts of 2-methyl methacrylate, 13-16 parts of ethylene-glycol, 20-30 parts of vermiculite, 1-2 parts of titanate coupling agent TMC-TTS, 26-29 parts of epoxidized triglyceride, 40-45 parts of bisphenol A epoxy acrylate, 10-12 parts of tripropylene glycol diacrylate, 7-9 parts of a photoinitiator 2959, and 4-5 parts of an additive. The additive improves the tenacity of the printing ink, enables the printing ink to disperse uniformly and maintains the stability of the printing ink. Moreover, the printing ink has the advantages of ultraviolet imaging, capability of developing in alkali water, and acid, alkali and neutral etching liquid resistance, and can be used for manufacturing high-definition patterns.

Description

technical field [0001] The invention relates to an ink and a preparation method thereof, in particular to a liquid photosensitive anti-corrosion ink and a preparation method thereof. Background technique [0002] Liquid photosensitive resist is a product developed on the basis of photoresist. It is an ink developed to solve the problem of making fine wire patterns, commonly known as wet film. Liquid photosensitive resist is composed of photosensitive resin, photosensitive agent, filler, additives, pigments and solvents. It can be used for high-precision handicrafts, hollow templates, pad printing gravure production, and can also be used for the production of fine wires in the inner layer of multi-layer boards. , because it uses epoxy resin as a thermosetting component, it has good chemical resistance, gold plating resistance, moisture resistance, heat resistance and electrical insulation. In view of this, liquid photosensitive resists are used in the production of high-prec...

AI Technical Summary

Problems solved by technology

[0003] At present, many domestic manufacturers have researched and produced liquid photosensitive resist inks, but these products are insufficient in comprehensive acid and alkali resistance, neutral etching solution and electroplating solution resistance, and generally can only adapt to acid and neutral etching solutions. and resistance to electroplating solution; in addition, existing products are difficult to achieve high resolution, and generally can only produce graphics with a minimum line width of 0.1 mm (mm)