Preparation method of chromium nitride/titanium aluminum zirconium chromium nitride multiple double-layer hard film

A technology of titanium aluminum zirconium chromium nitride and chromium nitride, which is applied in the direction of coating, metal material coating process, ion implantation plating, etc., can solve the problem that the hardness, wear resistance and heat resistance cannot meet the cutting requirements, and the preparation method Complexity, low efficiency and other problems, to achieve high film/substrate bonding force, simple and easy preparation process, and low friction coefficient

Inactive Publication Date: 2014-03-26
SHENYANG UNIV
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  • Abstract
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  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, the main disadvantage of this film is that its hardness, film/substrate bonding force, wear resistance and heat resistance cannot meet the cutting requirements under extremely harsh conditions.
[0005] For the titanium aluminum zirconium chromium series quaternary film with gradient struct

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0021] Preparation of chromium nitride / titanium aluminum zirconium chromium multi-layer hard reaction film on WC-8%Co hard alloy workpiece, the method is:

[0022] 1. Determination of deposition technology: Determine the multi-arc ion plating technology as the deposition technology of chromium nitride / titanium aluminum zirconium chromium double layer hard reaction film.

[0023] 2. Selection of target material composition: A combination of a chromium target and two titanium-aluminum-zirconium alloy targets is selected. The three targets are arranged at 90 degrees to each other. The middle arc source is a chromium target with a purity of 99.99%. The arc sources on both sides are It is a titanium-aluminum-zirconium alloy target, and the atomic ratio of titanium: aluminum: zirconium is 63:32:5.

[0024] 3. The selection and pretreatment process of the workpiece: WC-8%Co cemented carbide is selected as the workpiece material, and the surface of the workpiece is degreased and decon...

Embodiment 2

[0032] Preparation of chromium nitride / titanium aluminum zirconium chromium multi-layer hard reaction film on WC-8%Co hard alloy workpiece, the method is:

[0033] 1. Determination of deposition technology: Determine the multi-arc ion plating technology as the deposition technology of chromium nitride / titanium aluminum zirconium chromium double layer hard reaction film.

[0034] 2. Selection of target material composition: A combination of a chromium target and two titanium-aluminum-zirconium alloy targets is selected. The three targets are arranged at 90 degrees to each other. The middle arc source is a chromium target with a purity of 99.99%. The arc sources on both sides are It is a titanium-aluminum-zirconium alloy target, and the atomic ratio of titanium: aluminum: zirconium is 63:32:5.

[0035] 3. The selection and pretreatment process of the workpiece: WC-8%Co cemented carbide is selected as the workpiece material, and the surface of the workpiece is degreased and decon...

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Abstract

The invention discloses a preparation method of chromium nitride/titanium aluminum zirconium chromium nitride multiple double-layer hard film. The preparation method comprises the following steps: 1, determination of precipitation; 2, selection of target material components; 3, selection and pretreatment process of workpieces; 4, pre-bombardment process; 5, precipitation process; 6, heating and cooling process; 7, rotating process of the workpieces; 8, obtaining of the chromium nitride/titanium aluminum zirconium chromium nitride multiple double-layer hard film according to the preparation method provided by the invention. By adopting the preparation method, the high hardness and high film/substrate binding force of the film are guaranteed, the abrasion resistance of the film is improved, particularly, the heat resistance of the film is improved, the work efficiency is improved and the coating film cost is reduced; the method is simple and easy to operate.

Description

technical field [0001] The invention relates to a preparation method of a multi-component double-layer hard reaction film, in particular to a preparation method of a multi-component double-layer hard film of chromium nitride / titanium aluminum zirconium chromium. Background technique [0002] Multi-arc ion plating has the advantages of high ionization rate, low deposition temperature, fast film formation rate, strong binding force, dense film structure and easy adjustment of process parameters. This technology is suitable for the preparation of multi-component composite hard films, and is suitable for the preparation of titanium-based multi-component single-layer and multi-component gradient hard films such as titanium nitride, titanium aluminum nitride, titanium aluminum zirconium nitride, and titanium aluminum chromium nitride. have been successfully applied. [0003] Titanium aluminum zirconium chromium quaternary nitride hard film is more effective than titanium nitride ...

Claims

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Application Information

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IPC IPC(8): C23C14/06C23C14/22
Inventor 赵时璐张钧张震王双红张正贵
Owner SHENYANG UNIV
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