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Vertical type LED structure and manufacturing method thereof

A production method and vertical technology, applied in the direction of electrical components, circuits, semiconductor devices, etc., can solve problems such as easy diffusion, low reflectivity, and easy leakage of LED chips, so as to improve reflection efficiency, improve yield rate, and luminous effect. good effect

Inactive Publication Date: 2014-09-24
ENRAYTEK OPTOELECTRONICS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0005] However, the conventional metal mirror layer 40 has problems such as poor thermal stability and easy diffusion. In the LED chip manufacturing process, especially in the high-temperature annealing process, metal clusters or diffusion are often caused, and metal clusters will cause metal mirrors The reflectivity of layer 40 is reduced and a high-resistance state is formed locally on the electrode of the LED chip, so that the brightness of the LED chip is reduced or the voltage is increased, and the light efficiency of the overall LED chip is reduced.
The spread of metal causes the metal to climb to the side wall of the P / N junction, causing the LED chip to easily leak electricity, which will affect the service life of the LED chip

Method used

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  • Vertical type LED structure and manufacturing method thereof
  • Vertical type LED structure and manufacturing method thereof
  • Vertical type LED structure and manufacturing method thereof

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Embodiment Construction

[0034] The vertical LED structure of the present invention and its manufacturing method will be described in more detail below in conjunction with schematic diagrams, wherein a preferred embodiment of the present invention is shown, and it should be understood that those skilled in the art can modify the present invention described here and still implement the present invention. Beneficial effects of the invention. Therefore, the following description should be understood as the broad knowledge of those skilled in the art, but not as a limitation of the present invention.

[0035] In the interest of clarity, not all features of an actual implementation are described. In the following description, well-known functions and constructions are not described in detail since they would obscure the invention with unnecessary detail. It should be appreciated that in the development of any actual embodiment, numerous implementation details must be worked out to achieve the developer's ...

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Abstract

The invention provides a vertical type LED structure and a manufacturing method of the vertical type LED structure. A Bragg reflector structure replaces a metal reflector layer in the prior art to serve as a reflector, the Bragg reflector structure is provided with an opening, it can be ensured than a contact layer and a metal bonding layer are connected, the Bragg reflector structure can improve the heat stability of the reflector and avoid metal diffusion, and therefore the yield of a vertical type LED can be improved. Furthermore, the Bragg reflector structure formed by stacking two kinds of materials in multiple layers, one of the layers has a high refractive index, the reflection efficiency can be improved, and the luminous effect of the formed vertical type LED is better.

Description

technical field [0001] The invention relates to the field of LED manufacturing, in particular to a vertical LED structure and a manufacturing method thereof. Background technique [0002] In recent years, research on high-power light-emitting diodes (Light-Emitting Diode, LED) has become a trend. However, LED chips with the same side structure have disadvantages such as current crowding, high voltage, and difficulty in heat dissipation, making it difficult to meet high-power requirements. The vertical LED chip can not only effectively solve the crowding effect under high current injection, but also alleviate the reduction of internal quantum efficiency caused by high current injection, and improve the photoelectric performance of the vertical LED chip. [0003] At present, the preparation process of vertical LED chips is mainly to grow a GaN epitaxial layer on a substrate (usually sapphire material), make a contact layer and a metal mirror layer on the GaN-based epitaxial la...

Claims

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Application Information

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IPC IPC(8): H01L33/00H01L33/46
CPCH01L33/00H01L33/46H01L33/0066H01L33/0075
Inventor 张楠
Owner ENRAYTEK OPTOELECTRONICS
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