A method of making microchannel plate functional layer by atomic layer deposition technology
An atomic layer deposition and microchannel plate technology, applied in the field of functional layers, can solve the problems of short lifespan, unstable performance, and complicated fabrication of microchannel plate functional layers, and achieve the effect of prolonging lifespan, improving production efficiency, and having a dense structure.
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[0043] The atomic layer deposition technology produces the resistance layer and the emission layer of the microchannel plate, which has extremely high precision requirements for various operations and parameters in the preparation process. Such as figure 1 As shown, according to the set procedure, the control system first opens the valve of the clean gas device to feed the clean gas into the vacuum chamber, and at the same time opens the valve of the vacuum pump pipeline to remove impurity gas, and at the same time detects the composition and concentration of the exhaust gas. When the concentration of clean gas in the exhaust gas reaches the set threshold, close the valve of the vacuum pump pipeline, and then close the valve of the clean gas device.
[0044] Then according to the doping sequence DEZ / TMA / H 2 O, Al-Zn doping ratio 19:1, exposure time DEZ / N 2 / H 2 O / N 2 =0.1s / 3s / 0.1s / 4s, TMA / N 2 / H 2 O / N 2 =0.1s / 3s / 0.1s / 4s, DEZ / N 2 / TMA / N 2 / H 2 O / N 2 =0.1s / 3s / 0.1s / 3s / ...
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