Preparation method of silicon ingot with large-size column crystals
A large-size, silicon ingot technology, applied in chemical instruments and methods, crystal growth, polycrystalline material growth, etc., can solve problems affecting the purity of silicon ingots, difficult to achieve columnar crystal width, granular silicon pollution, etc., to reduce grain boundaries The effect of quantity, large width, and increasing average width
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specific Embodiment approach 1
[0038] Specific embodiment one: a kind of preparation method of the silicon ingot with large-size columnar crystal of this embodiment, it realizes according to the following steps:
[0039] Step 1. The upper end surface of the graphite base 7 is set at a distance of 25 mm to 30 mm from the upper end surface of the cold crucible 8, the hopper 26 is filled with granular silicon, and 250 g to 300 g of granular silicon is first leaked into the upper end surface of the graphite base 7;
[0040] Step 2, using the vacuum pump 3 to evacuate the vacuum chamber 2 so that the vacuum degree of the vacuum chamber 2 is 0.05Pa~0.1Pa;
[0041] Step 3, filling the vacuum chamber 2 with argon gas of 300-400 Pa;
[0042]Step 4: The induction coil 17 is fed with single-phase alternating current, the power supply is 50kW-55kW, and the granular silicon in the cold crucible 8 is heated and completely melted through the induction coil 17. The wire diameter of the induction coil 17 is Φ8mm-Φ12mm, and ...
specific Embodiment approach 2
[0047] Specific implementation mode two: combination figure 1 To describe this embodiment, the material of the cold crucible 8 in Step 1 of this embodiment is copper, and cooling water passes through the copper. Water-cooled copper does not pollute granular silicon. Other steps are the same as in the first embodiment.
specific Embodiment approach 3
[0048] Specific implementation mode three: combination figure 1 To describe this embodiment, in Step 1 of this embodiment, 250 g of granular silicon is first leaked into the upper end surface of the graphite base 7 . Other steps are the same as in the first embodiment.
[0049] Specific implementation mode four: combination figure 1 To describe this embodiment, the degree of vacuum of the vacuum chamber 2 in Step 2 of this embodiment is 0.08Pa. Other steps are the same as in the first embodiment.
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