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Photosensitive resin composition, color filter and liquid crystal display device using the same

A technology of photosensitive resin and composition, which is applied in the direction of optical filters, optical elements, photosensitive materials used in optomechanical equipment, etc., and can solve problems such as poor reliability

Inactive Publication Date: 2015-02-11
CHI MEI CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] Although the existing photosensitive resin composition with increased black pigment content can meet the needs of the industry, however, the photosensitive resin composition of the above-mentioned prior art tends to have the problem of poor reliability after development in a high-temperature and high-humidity environment

Method used

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  • Photosensitive resin composition, color filter and liquid crystal display device using the same
  • Photosensitive resin composition, color filter and liquid crystal display device using the same
  • Photosensitive resin composition, color filter and liquid crystal display device using the same

Examples

Experimental program
Comparison scheme
Effect test

preparation example A-1-1

[0172] In a three-necked flask with a capacity of 500 milliliters, add 0.30 mole of methyltrimethoxysilane (hereinafter referred to as MTMS), 0.45 mole of phenyltrimethoxysilane (hereinafter referred to as PTMS), 0.05 mole of 3-( Triethoxysilyl) propyl succinic anhydride (hereinafter referred to as GF-20), 0.2 moles of 3-(trimethoxysilyl) propyl methacrylate (hereinafter referred to as KBM-503) and 180 grams 4-hydroxy-4-methyl-2-pentanone (hereinafter abbreviated as DAA), and added oxalic acid aqueous solution (0.4 g of oxalic acid dissolved in 75 g of water) within 30 minutes while stirring at room temperature. Next, the flask was immersed in a 30° C. oil bath, and after stirring for 30 minutes, the above-mentioned reaction solution was heated to 110° C., and the stirring was continued to perform polycondensation reaction. After reacting for 6 hours, the solvent in the solution was removed by distillation to obtain the polysiloxane polymer (A-1-1).

preparation example A-1-2 to A-2-2

[0174] Preparations A-1-2 to A-2-2 use the same preparation method as that of the polysiloxane polymer (A) in Preparation A-1-1, except that Preparation A-1 -2 to A-2-2 are to change the type and amount of raw materials in the polysiloxane macromolecule and the polymerization conditions. The formula and polymerization conditions are shown in Table 1, and will not be repeated here.

[0175] Preparation of Resin with Unsaturated Groups (F)

Synthetic example F-1

[0177] With 100 parts by weight of fluorene epoxy compound (manufactured by Nippon Steel Chemical Co., Ltd., the product of model ESF-300; its epoxy equivalent is 231), 30 parts by weight of acrylic acid, 0.3 parts by weight of benzyl triethyl chloride Ammonium ammonium, 0.1 weight part of 2,6-di-tert-butyl-p-cresol and 130 weight parts of propylene glycol methyl ether acetate were added to a 500mL four-necked flask in a continuous manner, and the feed rate was controlled at 25 weight parts. servings / minute. The temperature of the reaction process is maintained at 100° C. to 110° C., and after 15 hours of reaction, a light yellow transparent mixed liquid with a solid content concentration of 50 wt % can be obtained.

[0178] Next, 100 parts by weight of the light yellow transparent mixed liquid obtained above was dissolved in 25 parts by weight of ethylene glycol ether acetate, and 6 parts by weight of tetrahydrophthalic anhydride (tetrahydrophthalic anhydride) and 13 parts by...

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Abstract

The present invention relates to a photosensitive resin composition for a black matrix, a color filter including the black matrix and a liquid crystal display device using the same. The aforementioned photosensitive resin composition includes a polysiloxane (A), a compound having a vinyl unsaturated group (B), a photo initiator (C), a solvent (D) and a black pigment (E). The compound having the vinyl unsaturated group (B) includes a compound having an acidic group and at least three vinyl unsaturated groups (B-1).

Description

technical field [0001] The invention relates to a photosensitive resin composition for a black matrix, a color filter and a liquid crystal display element formed by using the black matrix. In particular, it provides a photosensitive resin composition for a black matrix with high reliability under high temperature and high humidity conditions, and a color filter and a liquid crystal display element formed using the black matrix. Background technique [0002] In order to improve the contrast and display quality of current liquid crystal displays, a black matrix is ​​generally placed in the gaps between the stripes and dots of the color filter, and the black matrix can prevent light leakage between pixels from causing damage. Defects such as decreased contrast and decreased color purity. However, in the past, the materials used in the black matrix are mainly vapor-deposited films containing chromium or chromium oxide. However, when the above-mentioned vapor-deposited films are...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/004G03F7/075G02B5/20G02F1/1335
CPCG02B5/201G02B5/23G02F1/133512
Inventor 曾靖渊廖豪伟
Owner CHI MEI CORP