Silicon-dioxide optical waveguide production process for manufacturing optical divider

Abstract

The invention discloses a silicon-dioxide optical waveguide production process for manufacturing an optical divider. The silicon-dioxide optical waveguide production process includes a lower waveguide wrapping layer manufacturing step, a waveguide core layer manufacturing step, a lower waveguide wrapping layer and waveguide core layer annealing and hardening step, a photoetching step, a non-waveguide area treatment step, an upper waveguide wrapping layer manufacturing step and an upper waveguide wrapping layer annealing and hardening processing step. The lower waveguide wrapping layer manufacturing step includes growing a SiO2 layer on a silicon wafer by the flame hydrolysis method or the chemical vapor deposition process, and doping phosphorous and boron ions as a lower waveguide wrapping layer. The waveguide core layer manufacturing step includes growing another SiO2 layer on the lower wrapping layer as a waveguide core layer by the flame hydrolysis method or the chemical vapor deposition process. The lower waveguide wrapping layer and waveguide core layer annealing and hardening step includes adopting annealing and hardening to let the two SiO2 layers be compact and uniform; the photoetching step includes protecting required waveguide graphs with photoresist. The non-waveguide area processing step includes etching a non-waveguide area by the reactive ion etching process. The upper waveguide wrapping layer manufacturing step includes removing the photoresist, covering another SiO2 layer on the waveguide core layer again by the flame hydrolysis method or the chemical vapor deposition process and doping the boron and phosphorous ions as an upper waveguide wrapping layer. The upper waveguide wrapping layer annealing and hardening step is used for fining and compacting the SiO2 layer of the upper waveguide wrapping layer. According to the above theory, the optical divider manufactured by the silicon dioxide optical waveguide is low internal residual stress, insignificant in birefrigent effect and is good in mechanical performance and thermal stability.

Description

technical field [0001] The invention relates to the field of manufacturing optical splitters, in particular to a production process of silicon dioxide optical waveguides used for manufacturing optical splitters. Background technique [0002] Like the coaxial cable transmission system, the optical network system also needs to couple, branch, and distribute optical signals, which requires optical splitters to achieve. Optical splitter, also known as optical splitter, is one of the important passive devices in optical fiber links. input terminals and N output terminals. Optical splitters used in fiber optic CATV systems are generally 1×2, 1×3 and 1×N optical splitters composed of them. Optical splitters are generally made on six materials, including lithium niobate, semiconductor compounds, silicon dioxide, silicon-on-insulator, polymers, and glass. Nowadays, optical splitters made of silicon dioxide waveguides have excessive residual stress inside the material. Large, the b...

AI Technical Summary

Problems solved by technology

Optical splitters are generally made on six materials, including lithium niobate, semiconductor compounds, silicon dioxide, silicon-on-insulator, polymers, and glass. Nowadays, optical splitters made of silicon dioxide waveguides have excessive residual stress inside the material. Large, the birefringence effect is obvious, and the structural parameters of the waveguide are poor, which affects the mechanical properties and thermal stability of the fabricated optical splitter

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