Laminate

A technology of laminates and silicon-containing layers, applied in the directions of coating, lamination, layered products, etc., can solve the problem of insufficient barrier properties, and achieve excellent flexural resistance, high oxygen barrier properties and water vapor barrier properties. Effect

Inactive Publication Date: 2015-02-25
MITSUI CHEM INC +1
View PDF7 Cites 11 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the barrier performance is still insufficient for electronic component applications requiring high gas barrier performance

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Laminate
  • Laminate
  • Laminate

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0244] Polysilazane (NL110A , AZ ELECTRONIC MATERIALS Co., Ltd.) 4.5 wt% xylene (dehydrated) solution was dried at 150° C. for 90 seconds to produce a polysilazane film with a thickness of 0.15 μm.

[0245] This polysilazane film was subjected to low-pressure plasma treatment under the following conditions to form a silicon-containing layer (B).

[0246] Vacuum plasma processing device: Low-voltage capacitively coupled plasma processing device (manufactured by YOUTEC Co., Ltd.)

[0247] Gas: He

[0248] Gas flow: 50mL / min

[0249] Pressure: 19Pa

[0250] Applied power per electrode unit area: 1.3W / cm 2

[0251] Frequency: 13.56MHz

[0252] Processing time: 30 seconds

[0253] Oxygen concentration: below 1ppm

[0254] Water vapor concentration: below 1ppm

[0255] Then, on the silicon-containing layer (B) made with 2.8g / m 2 The above-mentioned solution (A) was applied in an amount of , and dried using a hot air dryer at a temperature of 60° C. for 30 seconds. Then, i...

Embodiment 2

[0259] Polyurethane acrylate (urethane acrylate UV-like curing coating material (trade name UA-100 manufactured by Shin-Nakamura Chemical Co., Ltd.), using a Meyer rod to 1.2g / m 2 (solid content) was applied, and dried at 100° C. for 15 seconds. Then, using a UV irradiation device (EYE GRANDAGE model ECS 301G1 manufactured by EyeGraphic Co., Ltd.), at a UV intensity of 250 mW / cm 2 , Cumulative light intensity is 117mJ / cm 2 Under certain conditions, the coated surface is light-cured, and the primer layer is set. Furthermore, a 4.5wt% xylene (dehydrated) solution of polysilazane (NL110A, manufactured by AZ ELECTRONIC MATERIALS Co., Ltd.) was coated thereon by bar coating, and dried at 150° C. for 90 seconds to produce a 0.15 μm-thick film. polysilazane film. Then, the same operation as in Example 1 was performed to obtain a laminated body. Table 1 shows the measurement results of physical properties of the obtained laminate.

Embodiment 3

[0261] Except having changed the solution A used in Example 2 into solution B, it carried out similarly to Example 2, and obtained the laminated body. Table 1 shows the measurement results of physical properties of the obtained laminate.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
particle diameteraaaaaaaaaa
thicknessaaaaaaaaaa
Login to view more

Abstract

This laminate is composed of a base (A), a silicon-containing layer (B) and a polymer layer (C) that is obtained from an organic acid metal salt having a polymerizable group, said silicon-containing layer (B) and polymer layer (C) being sequentially formed on at least one surface of the base (A). The silicon-containing layer (B) has a high nitrogen concentration region that is formed of: silicon atoms and nitrogen atoms; silicon atoms, nitrogen atoms and oxygen atoms; or silicon atoms, nitrogen atoms, oxygen atoms and carbon atoms. This high nitrogen concentration region is formed by modifying at least a part of a polysilazane film that is formed on the base (A) by irradiating the polysilazane film with an energy ray at an oxygen concentration of 5% or less and / or at a relative humidity of 30% or less at a room temperature of 23°C.

Description

technical field [0001] Provides a laminate excellent in oxygen and water vapor barrier properties. Background technique [0002] In recent years, transparent gas barrier materials that block gases such as oxygen and water vapor have been used not only as packaging materials for food and pharmaceuticals, which has been the main application until now, but also for flat panel displays (FPDs) such as liquid crystal displays, solar energy Electronic components such as components for batteries (substrates, back sheets, etc.), flexible substrates for organic electroluminescence (organic EL) elements, and sealing films. In these uses, very high gas barrier properties are required. [0003] At present, for transparent gas barrier materials that have been used in some applications, there are dry processes such as vapor deposition, plasma CVD, sputtering, ion plating, and catalyst CVD to show gas barrier properties. A method for depositing permanent silicon, aluminum oxides, nitrides...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): B32B9/00B32B27/00B32B37/00H01L31/048C08J7/043C08J7/044C08J7/046C08J7/048C08J7/052
CPCB32B37/00B32B2310/0831B32B9/00B32B2457/12B32B2457/20H01L31/0481B32B27/00B32B2309/105B32B2310/08Y02E10/50B32B37/182B32B9/04B32B27/06C08J2443/00C08J2333/14C08J2367/02C08J7/0423B32B27/08B32B27/28B32B2307/7244B32B2307/7246C08J2483/00C08J2483/16C08J7/042C08J7/126Y10T428/31663
Inventor 福本晴彦小田川健二臼井英夫高桥英一高木斗志彦高野雅子中村修进藤清孝
Owner MITSUI CHEM INC
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap