A kind of CRN coating preparation method on substrate surface
A substrate and coating technology, applied in the field of CrN coating preparation on the surface of the substrate, can solve the problems of difficult to meet the development of oceans and high friction coefficient of CrN coating, achieve good application value, improve comprehensive performance and service life, and high load-carrying capacity Effect
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Embodiment 1
[0049] In this embodiment, the substrate is a stainless steel gear in a ship power plant, and a CrN coating is prepared on the surface of the substrate, and the preparation method is as follows:
[0050] (1) Pre-plating treatment
[0051] Put the substrate into petroleum ether, and clean it with ultrasonic stirring for 30 minutes. After removing the oil on the surface of the substrate, put it into acetone and ultrasonically clean it for 20 minutes, then ultrasonically clean it in absolute ethanol for 15 minutes, and finally take it out and dry it with nitrogen;
[0052] (2) Bias reverse sputter cleaning
[0053] Put the substrate treated in step (1) into the multi-arc ion plating chamber, the temperature of the chamber is 350°C, and the back vacuum is pre-evacuated to 4.00×10 -3 Pa; then, pass Ar gas with a purity greater than or equal to 99.999% into the cavity, the Ar gas flow rate is 100 sccm, the substrate is applied with a negative bias voltage, and the substrate is cont...
Embodiment 2
[0119] In this embodiment, the substrate is a stainless steel-based sealing ring in key marine components, and a CrN coating is prepared on the surface of the substrate. The preparation method is as follows:
[0120] The processing technical operation steps are:
[0121] (1) Same as step (1) in Example 1, implement ultrasonic cleaning to the substrate;
[0122] (2) Same as step (2) in Example 1, implement bias reverse sputtering cleaning to the substrate;
[0123] (3) Same as step (3) in Example 1, depositing a hard Cr transition layer on the substrate surface;
[0124] (4) Deposition of CrN hard wear-resistant coating
[0125] Cut off the Ar gas flow and keep the chamber vacuum at 4×10 -3 Pa, and then pass N into the cavity with a purity greater than or equal to 99.999% 2 As a reaction gas, the flow rate is 600sccm, and the vacuum degree is maintained at 3.5Pa; the Cr target current is increased to 70A, the deposition temperature is maintained at 400°C, and a negative bia...
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