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A method for controlling abrasive particle size in nano-diamond polishing liquid

A technology of nano-diamond and abrasive particle size, applied in polishing compositions containing abrasives, etc., can solve the problems of low classification efficiency and complex classification process, and achieve the effect of stable product performance and simple process

Active Publication Date: 2017-12-26
ZHENGZHOU RES INST FOR ABRASIVES & GRINDING CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The purpose of the present invention is to provide a method for controlling the particle size of the abrasive in the nano-diamond polishing liquid, which can make the average particle size of the abrasive in the nano-diamond polishing liquid adjustable between 30-300nm, and solve the problem of the classification process in the current nano-diamond polishing liquid. Complex, low-grading problems

Method used

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  • A method for controlling abrasive particle size in nano-diamond polishing liquid
  • A method for controlling abrasive particle size in nano-diamond polishing liquid

Examples

Experimental program
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Effect test

Embodiment 1

[0030] (1) First weigh 1 g of commercially available nano-diamond prepared by detonation method and 0.13 g of sodium hexametaphosphate, and ultrasonically disperse in mechanical stirring or deionized water to prepare a dispersion with a mass fraction of 1%, and then place it in a high-energy ball mill , ball milled for 1 hour, took out the dispersion, filtered through 0.5um filter paper to remove impurities, adjusted the pH value to 8 with 0.2g of ammonia water, added 0.6g of sodium dodecylbenzenesulfonate, 10g of polyethylene glycol 200, and ultrasonicated for 60min. The power is 3000W, and the nano-diamond polishing liquid with an average particle size of 30nm is obtained, which is used as the mother liquid for controlling the abrasive grain size in the nano-diamond polishing liquid.

[0031] (2) Add 0.06g of Nacl and 10g of ethylene glycol to the nano-diamond polishing solution obtained in step (1) with an average particle size of 30nm, stir, ultrasonic time for 20min, and u...

Embodiment 2

[0033] (1) First weigh 0.2g of commercially available nano-diamond prepared by detonation method and 0.15g of ammonium sulfate, and ultrasonically disperse in mechanical stirring or deionized water to prepare a dispersion with a mass fraction of 0.2%, and then place it in a high-energy ball mill, Ball mill for 1 hour, take out the dispersion, filter through 0.5um filter paper to remove impurities, adjust the pH value to 5 with 0.15g citric acid, add 1.2g sodium dodecylbenzenesulfonate, 5g polyethylene glycol 400, ultrasonic 40min, ultrasonic The power is 2500W, and the nano-diamond polishing liquid with an average particle diameter of 30nm is obtained. It is used as the mother liquid for abrasive grain size control in nano-diamond polishing liquid.

[0034] (2) Add 0.04 g of dispersant KCl, 18 g of glycerin, and 8 g of ethylene glycol to the mother liquid of nano-diamond polishing solution obtained in step (1) with an average particle size of 30 nm, stir, ultrasonic time 20 mi...

Embodiment 3

[0036] (1) Similar to Example 2, a nano-diamond polishing solution with an average particle size of 30 nm was prepared as a mother solution for controlling the abrasive particle size in the nano-diamond polishing solution.

[0037] (2) Add 0.02 g of dispersant KCl, 4 g of glycerin, and 1 g of ethylene glycol to the mother liquid of nano-diamond polishing liquid obtained in step (1) with an average particle size of 30 nm, stir, ultrasonic time for 10 min, and ultrasonic power of 600 W to obtain an average Nano-diamond polishing liquid with a particle size of 60nm. The particle size distribution of 60nm particle size nano-diamond polishing liquid is as follows figure 2 shown.

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Abstract

The invention discloses a method for controlling the particle size of abrasives in a nano-diamond polishing liquid, which comprises the following steps: (1) deagglomerating the nano-diamond to obtain a nano-diamond polishing liquid; (2) using the nano-diamond obtained in step (1) for polishing Liquid, under the action of jet pulverizer or ultrasonic cell pulverizer, add inorganic salt dispersant and dispersion stabilizer to obtain nano-diamond polishing fluid with adjustable average particle size between 30-300nm. The present invention adds different dispersants and dispersion stabilizers to the nano-diamond polishing liquid to achieve the purpose of grading the particle size of the abrasive in the nano-diamond polishing liquid. The method has the advantages of simple process, easy industrial production, no need for other grading equipment, and the purpose of particle size control can be realized by directly adding a particle size control agent, which is simple and easy. The performance of the product after particle size control is stable, and the average particle size can be stabilized for more than three months without agglomeration. It can be applied to different polishing environments and obtain different processing effects.

Description

technical field [0001] The invention relates to the technical field of nano-diamond processing, in particular to a method for controlling the particle size of abrasives in a nano-diamond polishing liquid. Background technique [0002] Nano-diamond polishing liquid is widely used in ultra-precision polishing of computer hard disks, computer magnetic heads, sapphire substrates, silicon carbide wafers and optical glass due to its excellent performance. Due to the large specific surface area and high specific surface energy of nano-diamonds, nano-diamonds are in a thermodynamically unstable state, and agglomeration between particles is very easy to occur, and this agglomeration is difficult to be destroyed. [0003] In the application process of nano-diamond polishing fluid, good particle size control of the polishing fluid is an important guarantee for obtaining good processing results. At home and abroad, a series of physical and chemical modification methods are used to deag...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C09G1/02
Inventor 王沛王志强
Owner ZHENGZHOU RES INST FOR ABRASIVES & GRINDING CO LTD
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