Regeneration system and method of tetramethyl ammonium hydroxide developing waste liquid

Abstract

The invention relates to a regeneration system and method of a tetramethyl ammonium hydroxide developing waste liquid. The regeneration system comprises a plurality of feeding pumps, at least one group of neutralization separation device, at least one group of adsorption device, at least one group of cation exchange device, at least one group of anion exchange device and at least one group of purification processing device, wherein the neutralization separation device, the adsorption device, the cation exchange device, the anion exchange device and the purification processing device are sequentially connected by material tubes with control valves. According to the regeneration system, high-purity tetramethyl ammonium hydroxide developing liquid can be stably and circularly regenerated for a long time, so that the purposes of energy conservation and environment protection are achieved; meanwhile, the wastewater discharge pressure of a semiconductor factory is reduced, and the wastewater treatment cost of the factory is saved, so that the effective cyclic utilization of resources is realized.

Description

technical field [0001] The invention relates to a waste liquid regeneration system and method, in particular to a tetramethylammonium hydroxide developing waste liquid regeneration system and regeneration method. Background technique [0002] Electronic grade tetramethylammonium hydroxide (TetramethylAmmoniumHydroxide, referred to as TMAH) developer is widely used in liquid crystal display (TFT-LCD), IC, printed substrates and other manufacturing processes, including forming positive or negative light on substrates such as silicon wafers. The photoresist film is exposed to the photoresist film with a prescribed pattern through the mask, and then the exposed photoresist is cleaned with tetramethylammonium hydroxide developer TMAH, and then the etching process is performed, and the stripping solution is used to remove the photoresist film. Peel off the insoluble photoresist film on the substrate to achieve the desired pattern. [0003] The tetramethylammonium hydroxide TMAH d...

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Problems solved by technology

[0006] But, the method of patent document CN101111804A needs to measure the concentration of tetraalkylammonium and the content of metal ion impurity in the developing waste liquid, and the content of each metal ion impurity is less than 50ppm with respect to the amount of tetraalkylammonium, just can delicate treatment reclaim Utilization; When the content of at least one metal ion impurity is higher than 50ppm relative to the amount of tetraalkylammonium, the refined treatment cannot be directly carried out, because the excessive metal ion impurity content will reduce the service life of the electrode in the electrolysis process. In this case, the developer needs to be discarded, or diluted with new unused tetraalkylammonium hydroxide developer, so that the relative content of each metal ion can reach the standard of less than 50ppm, and the diluted Developing waste liquid, regenerated into recyclable tetraalkylammonium hydroxide developer

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