A transparent field-effect ultraviolet detector controlled by grid voltage and its preparation method
An ultraviolet detector and field effect technology, applied in the field of ultraviolet detectors, can solve problems such as unsatisfactory effects, and achieve the effects of bottom excitation threshold, good light transmittance and high detection efficiency
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Embodiment 1
[0055] The transparent field-effect ultraviolet detector controlled by the gate voltage of this embodiment is a bottom-gate top electrode structure, such as figure 1 , 2 shown, including:
[0056] The substrate 1 is ITO conductive glass; the upper conductive film of the ITO conductive glass is an ITO gate electrode 2;
[0057] The gate electrode insulating layer 3 is transparent ZrO 2 a film located on the ITO gate electrode 2;
[0058] The active layer 4, which is a transparent InZnO film, is located on the gate electrode insulating layer 3;
[0059] The source electrode 5 and the drain electrode 6 are both transparent InZnO films, and are respectively connected to the active layer 4 .
[0060] Wherein, the transparent InZnO film is an indium oxide-doped zinc oxide transparent conductive oxide film; in the transparent InZnO film, the mass percentage of indium oxide is 5%, and the balance is zinc oxide.
[0061] The thickness of the insulating layer of the gate electrode ...
Embodiment 2
[0076] The grid-voltage-controlled transparent field-effect ultraviolet detector of this embodiment has a bottom-gate and top-electrode structure, and its specific structure is the same as that of Embodiment 1. Wherein, the transparent InZnO film is an indium oxide-doped zinc oxide transparent conductive oxide film; in the transparent InZnO film, the mass percentage of indium oxide is 1%, and the balance is zinc oxide.
[0077] The thickness of the insulating layer of the gate electrode is 200nm; the thickness of the active layer is 100nm; the thickness of the source electrode and the drain electrode is 200nm.
[0078] The preparation method of the grid-voltage-controlled transparent field-effect ultraviolet detector of the present embodiment comprises the following steps:
[0079] 1) Prepare the gate electrode insulating layer by sol-gel method:
[0080] 1.1 Take the ITO conductive glass as the substrate, wash it with deionized water, acetone, and alcohol in sequence, and se...
Embodiment 3
[0092] The grid-voltage-controlled transparent field-effect ultraviolet detector of this embodiment has a bottom-gate and top-electrode structure, and its specific structure is the same as that of Embodiment 1. Wherein, the transparent InZnO film is an indium oxide-doped zinc oxide transparent conductive oxide film; in the transparent InZnO film, the mass percentage of indium oxide is 10%, and the balance is zinc oxide.
[0093] The thickness of the insulating layer of the gate electrode is 250nm; the thickness of the active layer is 150nm; the thickness of the source electrode and the drain electrode is 250nm.
[0094] The preparation method of the grid-voltage-controlled transparent field-effect ultraviolet detector of the present embodiment comprises the following steps:
[0095] 1) Prepare the gate electrode insulating layer by sol-gel method:
[0096] 1.1 Take the ITO conductive glass as the substrate, wash it with deionized water, acetone, and alcohol in sequence, and s...
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