Nylon slice process wastewater treatment device and its treatment method

A wastewater treatment and process technology, which is applied in the field of nylon slicing process wastewater treatment devices, can solve the problems of exhaust gas being discharged into the atmosphere and the effect of reducing ammonia nitrogen is not obvious, and achieve the effect of reducing environmental pollution

Active Publication Date: 2019-04-19
HANGZHOU JUHESHUN NEW MATERIAL CO LTD
View PDF5 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The technical problem to be solved by the present invention is to provide a wastewater treatment device for nylon slicing process and its treatment method, which can effectively solve the problem that the effect of reducing ammonia nitrogen in the existing contact pool is not obvious and the waste gas is directly discharged into the atmosphere

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Nylon slice process wastewater treatment device and its treatment method
  • Nylon slice process wastewater treatment device and its treatment method
  • Nylon slice process wastewater treatment device and its treatment method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0026] Such as figure 1 , figure 2 , image 3 As shown, the nylon slicing process wastewater treatment device includes an anaerobic tank 1, an overflow pipe 21 is arranged on the anaerobic tank 1, and an anaerobic sedimentation tank 2 and an anoxic tank are sequentially arranged on the overflow pipe 21 along the overflow direction. 20. Contact oxidation secondary settling tank 9, tertiary peroxidation reaction tertiary settling tank 10, anoxic tank 20 is connected with a sealed pipe connected with the oil furnace fan, anaerobic settling tank 2 is provided with a convenient anaerobic settling tank 2. The first return pipe 22 for sludge return, the first return pipe 22 is connected to the anaerobic tank 1, and the contact oxidation secondary settling tank 9 is provided with a second return flow that facilitates the return of the mixed solution in the contact oxidation secondary settling tank 9 The pipe 91 and the second return pipe 91 are connected to the anoxic tank 20, and ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention relates to an ammonia nitrogen removal device for chinlon chips.The device comprises an anaerobic jar, wherein an overflow pipeline is arranged on the anaerobic jar, and an anaerobic sedimentation tank, an anoxic tank, a contact oxidation secondary sedimentation tank and a three-level peroxidatic reaction ternary sedimentation tank are arranged on the overflow pipeline in sequence.The device has the advantages that production process wastewater in a process wastewater pipeline and sanitary sewage in a sanitary sewer are collected in a centralized mode and homogenized through a water quality regulating reservoir, part of organic matter in wastewater is removed through the anaerobic jar, wastewater is made to pass through the anaerobic sedimentation tank, the anoxic tank, the contact oxidation secondary sedimentation tank and the three-level peroxidatic reaction ternary sedimentation tank in sequence through the overflow pipeline and then is collected through a middle pond, the content of CODcr in wastewater in the middle pond is 85-100 mg / l, the content of NH3-N is smaller than 0.1 mg / l, wastewater discharge standard is met, collection and utilization of wastewater are achieved, and environment pollution is reduced.The invention further discloses an ammonia nitrogen removal process for chinlon chips.

Description

technical field [0001] The invention relates to a wastewater treatment device for nylon slicing process and a treatment method thereof. Background technique [0002] At present, the existing nitrification and denitrification process A-O pool, A is the anoxic denitrification pool, which uses denitrifying bacteria to denitrify, and uses the water source to make the nitrate and nitrite in the reflux liquid denitrify and convert into nitrogen, from The overflow in the water is removed, while the O pool uses aerobic microbial degradation to fully decompose the remaining organic matter in the wastewater, and then uses the nitrification of the digestive bacteria to realize the nitrification reaction of ammonia nitrogen, and the mud and water are separated through the biochemical sufficient water to flow into the contact pool. The pool uses microorganisms to further process the residual ammonia nitrogen and organic matter. The effect of reducing ammonia nitrogen in contact with the ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Patents(China)
IPC IPC(8): C02F9/14C02F101/16C02F101/38
CPCC02F3/02C02F3/28C02F3/30C02F9/00C02F2101/16C02F2101/38Y02E50/30
Inventor 赵晓明刘平孙权周海
Owner HANGZHOU JUHESHUN NEW MATERIAL CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap