Preparing method for nanoimprint template

A nano-imprinting and template technology, applied in the field of nano-imprinting, can solve the problems of complicated operation and high cost, and achieve the effects of high repeatability, little structural loss and good shape retention.

Inactive Publication Date: 2016-08-03
SHANGHAI ADVANCED RES INST CHINESE ACADEMY OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] In view of the shortcomings of the prior art described above, the purpose of the present invention is to provide a method for preparing a nanoimprint template, which is used to solve the problems of cumbersome operation and high cost in the prior art

Method used

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  • Preparing method for nanoimprint template
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  • Preparing method for nanoimprint template

Examples

Experimental program
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Effect test

preparation example Construction

[0052] see figure 1 , the invention provides a method for preparing a nanoimprint template, the method comprising the following steps:

[0053] S11 provides the original template with a three-dimensional graphic structure with micro-nano dimensions;

[0054] S12 coating the sol on the substrate as a substrate;

[0055] S13 using the original template to emboss the complementary pattern of the micro-nano-sized three-dimensional pattern structure on the substrate and solidify;

[0056] S14 using the obtained substrate with the complementary pattern as a template in the subsequent nanoimprint process.

[0057] For specific preparation procedures, please refer to Figure 2a-Figure 2e .

[0058] first as Figure 2a As shown, the original template 101 provided in step S11 has a micro-nano-sized three-dimensional graphic structure, and the micro-nano-sized three-dimensional graphic structure can be columnar, cone-shaped, pyramid-shaped, pit-shaped, inverted cone-shaped, or inver...

Embodiment 1

[0077] In this example, the nanoimprint template preparation method of the present invention is used to prepare TiO 2 Template, and this template is used for flat hot pressing to prepare periodic patterned ETFE film, and its process is as follows:

[0078] 1. Provide a PDMS template with a micro-pit structure as the original template, wherein the micro-pit structure is composed of a plurality of pits of the same shape periodically arranged in an orderly manner, each pit has a depth of 2.45 μm and a diameter of 2.4 μm , the period is 3 μm, that is, the distance between the center of each pit and the center of its adjacent pit is 3 μm. Using a scanning electron microscope (SEM) to observe the surface morphology of the PDMS template, the resulting SEM image is as follows Figure 4 shown.

[0079] 2. Put TiO 2 The sol was spin-coated on a clean glass substrate as a substrate, TiO 2 The thickness of the sol is 5 μm, and the spin coating speed is 1000 revolutions per minute. The...

Embodiment 2

[0088] In this embodiment, the TiO prepared in Example 1 2The template is used for UV imprinting to prepare a periodically patterned photoresist structure, and the preparation process is as follows:

[0089] The ultraviolet imprinting glue is coated on a clean quartz glass substrate, and the thickness of the ultraviolet imprinting glue is 5 μm.

[0090] The TiO prepared in Example 1 2 The template is placed in the UV imprinting chamber, and then the quartz glass substrate coated with UV imprinting glue is placed on the TiO 2 On the template, apply a uniform pressure of 0.25MPa, and irradiate with ultraviolet light, and the irradiation power is 100mW / cm 2 , the irradiation time is 500 seconds.

[0091] After the UV imprinting glue is cured, TiO 2 The template is separated from the UV imprinting glue, that is, a micron-scale pit structure is formed on the quartz glass substrate. The pit depth is 1.370 μm, the diameter is 1.535 μm, and the period is 3 μm. The SEM image of the...

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Abstract

The invention provides a preparing method for a nanoimprint template .The method includes the following steps that a micro-nano original template of a three-dimensional graph structure is provided; a base is coated with sol to serve as a substrate; a complementary graph of the micro-nano three-dimensional graph structure is imprinted on the substrate with the original template through an imprinting technology; the obtained substrate with the complementary graph is used as the template in the follow-up nanoimprint process .The preparing method for the nanoimprint template is high in repeatability, capable of preparing the inorganic template fast at low cost on a large scale and capable of being used in the processes of ultraviolet imprinting and thermal imprinting, the prepared template is high in mechanical strength and reutilization, conformality in the follow-up imprinting process is good, a base material with a higher depth ratio can be obtained by using the template as a mask plate after etching, and the problem that the structure is shallow after etching when photoresist serves as the mask plate can be solved.

Description

technical field [0001] The invention relates to the technical field of nanoimprinting, in particular to a method for preparing a nanoimprinting template. Background technique [0002] The process of nanoimprinting (NIL) is similar to the casting process in mechanical manufacturing. Under certain auxiliary means, such as heat, ultraviolet light, solvent volatilization, etc., the curing glue goes through the process of flow, imprinting and curing, and transfers the microprint on the copy template. nanographic structure. Compared with other lithography technologies, nanoimprint technology has the advantages of high processing precision, simple process, high production efficiency, low cost, and suitable for industrial production. It has broad application prospects in the fields of circuits, microfabrication, biosensors, optical devices, etc. [0003] In the process of nanoimprinting, the imprinting template is used as the initial carrier of imprinting features, and its quality...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/00
CPCG03F7/0002G03F7/0017
Inventor 李东栋许贞邓昌凯马朋莎王敏罗晓雷殷敏鲁林峰陈小源
Owner SHANGHAI ADVANCED RES INST CHINESE ACADEMY OF SCI
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