A processing method for light-trapping microstructure on polysilicon surface
A processing method and polysilicon technology, applied in sustainable manufacturing/processing, electrical components, climate sustainability, etc., can solve the problems of complex process, cumbersome process, surface damage, etc., and achieve the effect of good adaptability and simple process
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Embodiment 1
[0031] The processing method of the light-trapping microstructure on the surface of polysilicon in this embodiment is specifically as follows: select an n-type polysilicon wafer with a size of 2cm*2cm, place it in an etching solution for chemical etching, and the etching solution is an HF solution with a mass concentration of 39%. , HNO with a mass concentration of 67% 3 solution and a mass concentration of 76% H 2 SO 4 The mixing of the solution, and the HF solution and HNO in the corrosion solution 3 solution and H 2 SO 4 The volume ratio of the solution is 0.8:2:8.1. While performing chemical etching at room temperature, combined with Figure 5 A multi-frequency ultrasonic phased array is shown acting in a chemical corrosion reaction. Since the order of magnitude of the polysilicon light-trapping microstructure to be processed is at the micron level, that is, the reaction between the particles in the chemical corrosion is at the micron level, and the acoustic radiatio...
Embodiment 2
[0035] The difference between this embodiment and Embodiment 1 is that the corrosion solution is a HF solution with a mass concentration of 41%, and a HNO solution with a mass concentration of 68%. 3 solution and a mass concentration of 74% H 2 SO 4 The mixing of the solution, and the HF solution and HNO in the corrosion solution 3 solution and H 2 SO 4 The volume ratio of the solution is 1.2:1.7:7.9, and refer to Example 1 for other methods.
Embodiment 3
[0037] The difference between this embodiment and Embodiment 1 is that the corrosion solution is a HF solution with a mass concentration of 40%, and a HNO solution with a mass concentration of 69%. 3 solution and a mass concentration of 75% H 2 SO 4 The mixing of the solution, and the HF solution and HNO in the corrosion solution 3 solution and H 2 SO 4 The volume ratio of the solution is 1:2.3:8, and refer to Example 1 for other methods.
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